GaN纳米柱的量子效率研究

主要通过低温和室温变功率光致发光(PL)谱的实验手段,研究了GaN纳米柱和对应薄膜(作为参考)的量子效率表现.实验中发现在室温,激发光功率为0.5mW时,GaN纳米柱的积分PL强度是薄膜的12.2倍,这表明GaN纳米柱具有比薄膜更高的内量子效率和光引出效率.另外,依据高低温积分PL强度比的方法计算得到激发光功率0.5mW时,GaN纳米柱的内量子效率低于薄膜,该计算结果违背由实验现象得到的结果,这表明该内量子效率的计算方法是不合适的,因而建立了一种新模型,得到GaN纳米柱和薄膜的内量子效率比随激发光功率的变化规律,结果表明GaN纳米柱的内量子效率表现显著优于薄膜.     

氮化镓基Micro-LED显示技术研究进展

现代社会已经进入信息化并向智能化方向发展,显示是实现信息交换和智能化的关键环节。在目前众多显示技术中,Micro-LED显示技术被认为是具有颠覆性的次世代显示技术,得到学术界与产业界的广泛关注。Micro-LED显示技术是一种新自发光显示技术,具有对比度高、响应快、色域宽、功耗低及寿命长等优点,可以满足高级显示应用的个性化需求。然而目前在Micro-LED显示商业化进程中,依然存在一些技术瓶颈尚未解决。应用于Micro-LED晶圆的外延技术需考虑衬底选择、波长均匀性及缺陷控制等方面因素;Micro-LED器件的效率衰减问题目前依然没有有效的解决途径;此外利用颜色转换媒介实现单片Micro-LED全彩显示技术尚未成熟。本文从以上3个问题点出发,分别综述了Micro-LED显示目前存在的技术问题及研究现状。     

High-efficiency InGaN/AlInGaN multiple quantum wells with lattice-matched AlInGaN superlattices barrier

A new approach to fabricating high-quality AlInGaN film as a lattice-matched barrier layer in multiple quantum wells(MQWs) is presented. The high-quality AlInGaN film is realized by growing the AlGaN/InGaN short period superlattices through metalorganic chemical vapor deposition, and then being used as a barrier in the MQWs. The crystalline quality of the MQWs with the lattice-matched AlInGaN barrier and that of the conventional InGaN/GaN MQWs are characterized by x-ray diffraction and scanning electron microscopy. The photoluminescence(PL) properties of the InGaN/AlInGa N MQWs are investigated by varying the excitation power density and temperature through comparing with those of the InGaN/GaN MQWs. The integral PL intensity of InGaN/AlInGaN MQWs is over 3 times higher than that of InGaN/GaN MQWs at room temperature under the highest excitation power. Temperature-dependent PL further demonstrates that the internal quantum efficiency of InGaN/AlInGaN MQWs(76.1%) is much higher than that of InGaN/GaN MQWs(21%).The improved luminescence performance of InGaN/AlInGaN MQWs can be attributed to the distinct reduction of the barrier-well lattice mismatch and the strain-induced non-radiative recombination centers.     

Enhancement in solar hydrogen generation efficiency using InGaN photoelectrode after surface roughening treatment with nano-sized Ni mask

A significant enhancement in solar hydrogen generation efficiency has been achieved by inductive coupled etching （ICP） surface roughening treatment using nano-sized nickel mask. As much as 7 times improvement of photocurrent is demonstrated in comparison with a planar one fabricated from the same parent wafer. Under identical illumination conditions in HBr solution, the incident photon conversion efficiency （IPCE） shows an enhancement with a factor of 3, which even exceed 54% at 400 nm wavelength. We believe the enhancement is attributed to several facts including improvement in absorption, reacting area, carder localization and carrier lifetime.