氢气氛区熔硅单晶热处理缺陷形成机理

本文用薄晶体电镜,x射线衍射形貌和金相腐蚀坑法研究了氢区熔硅单晶热处理缺陷形成机理。 通过变温热处理,发现氢区熔硅单晶热处理缺陷主要是由氢沉淀引起的。沉淀过程可能首先是Si-H键分解,然后是氢的扩散聚集,测出沉淀过程激活能是56.000±3000卡/克分子,它可能是Si-H键的分解激活能。沉淀物的析出面是{111}晶面,几何形态起始近似球状,然后变成扁椭球,最后是沿<110>方向拉长的片状沉淀物。 随着沉淀物的长大,在一定温度下(约600-700℃)会在沉淀物周围发射稜柱位错环,其分布形态和热处理温度有关。高温热处理时,沉淀物周围能发射出高对称的多组稜柱位错环,形成“星形”位错群。稜柱位错的稜柱面是{111}晶面,柏氏矢量是a╱2<110>。发射方向是<110>方向,位错线是<112>方向。     

Ham理论的验证及其应用

利用直拉硅单晶中氧化物沉淀的生长，选择两步热处理制度，验证了Ｈａｍ有关扩散控制沉淀生长理论。并尝试应用Ｈａｍ理论对氧化物沉淀的形核进行处理。 关键词：     

INTERACTION OF OXYGEN PRECIPITATES WITH STRUCTURAL DEFECTS IN CZ Si CRYSTALS

This paper ia dealing with the interaction between oxygen precipitates and structural defects in CZ Si crystals. Different lattice defects: dislocation loops, rod-like defects and stacking faults have been observed as a consequence of oxygen precipitation. In turn, these defects also promote the nucleation and growth of the oxygen precipitates. It is shown that the dislocation dipole is more efficient than single dislocation in enhancing the oxygen precipitate formation.