Two-Step Growth of MgO Films on Sapphire （0001） Substrates by Radio Frequency Plasma-Assisted Molecular Beam Epitaxy

We report on the growth of rock salt MgO films on sapphire (0001) substrates by rf plasma-assisted molecular beam epitaxy.A two-step method,i.e.high temperature epilayer growth after low-temperature buffer layer growth,was adopted to obtain the single crystal MgO film.The epitaxial orientation between the MgO epilayer and the sapphire (0001) substrate was studied by using in situ reflection high energy electron diffraction and ex situ x-ray diffraction,and it is found that the MgO film grows with [111] orientation.The role of the low temperature buffer layer in the improvement of crystal quality of the MgO epilayer is discussed based on the cross-sectional scanning electron microscopy.     

电子回旋共振等离子体特性及其对生长氮化镓晶膜的影响

为了解并优化在电子回旋共振等离子体辅助化学汽相沉积GaN晶膜的工艺研究中的等离子体特性,利用朗缪尔探针及法拉第筒系统地测量了离子密度(N_i)、等离子体势(V_p)、电子温度(T_e)及离子流强(J_i)等多个等离子体参量随微波功率(P_w)及沉膜室气压(p)变化的关系.给出了在P_w＝850W,p＝0.22Pa时,上述等离子体参量的轴向及径向分布.GaN晶膜的生长速率、电学及晶体学性能 关键词：     

Sb complexes and Zn interstitials in Sb-implanted ZnO epitaxial films

In the present work, post-annealing is adopted to investigate the formation and the correlation of Sb complexes and Zn interstitials in Sb-ion implanted ZnO films, by using Raman scattering technique and electrical characterizations. The damage of Zn sublattice, produced by ion bombardment process is discerned from the unrecovered E2 (L) peak in annealed high Sb+ dose implanted samples. It is suggested that the Zn sublattice may be strongly affected by the introduction of Sb dopant because of the formation of SbZn-2VZn complex acceptor. The appearance of a new peak at 510 cm 1 in the annealed high dose Sb+ implanted samples is speculated to result from (Zn interstitials-O interstitials) Zni-Oi complex, which is in a good accordance with the electrical measurement. The p-type ZnO is difficult to obtain from the Sb+ implantation, however, which can be realized by in-situ Sb doping with proper growth conditions instead.     

Review of flexible and transparent thin-film transistors based on zinc oxide and related materials

Flexible and transparent electronics enters into a new era of electronic technologies.Ubiquitous applications involve wearable electronics,biosensors,flexible transparent displays,radio-frequency identifications(RFIDs),etc.Zinc oxide(ZnO) and relevant materials are the most commonly used inorganic semiconductors in flexible and transparent devices,owing to their high electrical performances,together with low processing temperatures and good optical transparencies.In this paper,we review recent advances in flexible and transparent thin-film transistors(TFTs) based on ZnO and relevant materials.After a brief introduction,the main progress of the preparation of each component(substrate,electrodes,channel and dielectrics) is summarized and discussed.Then,the effect of mechanical bending on electrical performance is highlighted.Finally,we suggest the challenges and opportunities in future investigations.     

表面人工低维结构的功能设计与构造

可控地构造具有一定功能的表面人工低维结构,并且总结、理解体系微观结构对其宏观性质影响的一般规律,不仅对探索低维基本物理以及其中的新奇量子现象至关重要,更是微电子工业保持持续发展的关键前提.这方面的研究包括发展新的生长技术实现对体系形成过程的精确控制,对获得的材料做高分辨率的表征;从理论上则要理解体系的生长过程,阐明热力学、动力学的作用机理,从而指导制备技术的发展.深入研究表面人工低维结构的性质更可能导致新物理现象与原理的发现,产生全新的器件概念,进一步反馈给体系功能的设计,推动基础研究与应用探索的发展.文章简要介绍了表面物理国家重点实验室近年来在表面人工低维结构的功能设计与构造方面的研究成果     

ZnO(000)表面的同步辐射角分辨光电子能谱研究

利用同步辐射角分辨光电子能谱(angle-resolved photoeletron spectroscopy,ARPES)并结合全势缀加平面波(full potential linearized augmented plane waves,FPLAPW)理论计算方法研究了ZnO(000(-1))表面的价带电子结构及能带色散.通过垂直出射的ARPES得到ZnO体态沿ΓA方向的能带结构并确定了两个表面态,实验结果与理论计算结果较为一致.利用非垂直出射的ARPES得到这两个表面态沿(-Γ)(-KM)方向的二维能带色散.     

Controlled Growth of Zn-Polar ZnO Films on Al-Terminated α-Al2O3(0001) Surface by Using Wurtzite MgO Buffer

The controlled growth of Zn-polar ZnO fihns on Al-terminated α-Al203 （0001） substrates is investigated by the radio-frequency plasma-assisted molecular beam epitaxy method. Prior to the growth, α-Al2O3 （0001） surface is modified by an ultrathin MgO layer, which serves as a uniform template for epitaxy of Zn-polar ZnO films. The microstructures of ZnO/MgO/Al2O3 interface are investigated by in-situ reflection high-energy electron diffraction observations and ex-situ high-resolution transmission electron microscopy characterization. It is found that under Mg-rich condition, the achievement of the wurtzite MgO ultrathin layer plays a key role in the subsequent growth of Zn-polar ZnO. An interracial atomic model is proposed to explain the mechanism of polarity selection of both MgO and ZnO films.     

ZnO(000(-1))表面的同步辐射角分辨光电子能谱研究

利用同步辐射角分辨光电子能谱（angle-resolved photoeletron spectroscopy,ARPES）并结合全势缀加平面波（full potential linearized augmented plane waves, FPLAPW）理论计算方法研究了ZnO（0001^-）表面的价带电子结构及能带色散．通过垂直出射的ARPES得到ZnO体态沿ГA方向的能带结构并确定了两个表面态，实验结果与理论计算结果较为一致．利用非垂直出射的ARPES得到这两个表面态沿Г^- KM^-方向的二维能带色散．     

氧化锌基材料、异质结构及光电器件

Ⅱ-Ⅵ族直接带隙化合物半导体氧化锌(ZnO)的禁带宽度为3.37 eV,室温下激子束缚能高达60 meV,远高于室温热离化能(26 meV),是制造高效率短波长探测、发光和激光器件的理想材料。历经10年的发展,ZnO基半导体的研究在薄膜生长、杂质调控和器件应用等方面的研究获得了巨大的进展。本文主要介绍了以国家"973"项目(2011CB302000)研究团队为主体,在上述方面所取得的研究进展,同时概述国际相关研究,主要包括衬底级ZnO单晶的生长,ZnO薄膜的同质、异质外延,表面/界面工程,异质结电子输运性质、合金能带工程,p型掺杂薄膜的杂质调控,以及基于上述结果的探测、发光和激光器件等的研究进展。迄今为止,该团队已经实现了薄膜同质外延的二维生长、硅衬底上高质量异质外延、基于MgZnO合金薄膜的日盲紫外探测器、可重复的p型掺杂、可连续工作数十小时的同质结紫外发光管以及模式可控的异质结微纳紫外激光器件等重大成果。本文针对这些研究内容中存在的问题和困难加以剖析并探索新的研究途径,期望能对ZnO材料在未来的实际应用起到一定的促进作用。