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利用价格低廉、性能优良的金属纳米颗粒增强太阳电池的光吸收具有广阔的应用前景. 通过建立三维数值模型, 模拟了微晶硅薄膜电池前表面周期性分布的Al纳米颗粒阵列对电池光吸收的影响, 并对其结构参数进行了优化. 模拟结果表明: 对于球状Al纳米颗粒阵列, 影响电池光吸收的关键参数是周期P与半径R的比值, 或者说是颗粒的表面覆盖度; 当P/R=4–5时, 总的光吸收较参考电池提高可达20%. 与球状颗粒相比, 优化后的半球状Al纳米颗粒阵列可获得更好的陷光效果, 但后者对颗粒半径R的变化较敏感. 另外, 结合电场分布, 对电池光吸收增强的物理机理进行了分析. 相似文献
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Effect of substrate temperature on microstructure and optical properties of single-phased Ag20 film deposited by using radio-frequency reactive magnetron sputtering method 下载免费PDF全文
Using a radio-frequency reactive magnetron sputtering technique, a series of the single-phased Ag20 films are deposited in a mixture of oxygen and argon gas with a flow ratio of 2:3 by changing substrate temperature (Ts). Effects of the Ts on the microstructure and optical properties of the films are investigated by using X-ray diffractometry, scanning electron microscopy and spectrophotometry. The single-phased Ag20 films deposited at values of Ts below 200℃ are (111) preferentially oriented, which may be due to the smallest free energy of the (111) crystalline face. The film crystallization becomes poor as the value of Ts increases from 100℃ to 225℃. In particular, the Ag20 film deposited at Ts=225℃ loses the (111) preferential orientation. Correspondingly, the film surface morphology obviously evolves from a uniform and compact surface structure to a loose and gullied surface structure. With the increase of Ts value, the transmissivity and the reflectivity of the films in the transparent region are gradually reduced, while the absorptivity gradually increases, which may be attributed to an evolution of the crystalline structure and the surface morphology of the films. 相似文献
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Effects of Rapid Thermal Processing on Microstructure and Optical Properties of As-Deposited Ag2O Films by Direct-Current Reactive Magnetron Sputtering 下载免费PDF全文
(111) preferentially oriented Ag2O film deposited by direct current reactive magnetron sputtering is annealed by rapid thermal processing at different annealing temperatures for 5 min. The film microstructure and optical properties are then characterized by x-ray diffractometry, scanning electron microscopy, and spectrophotometry, respectively. The results indicate that no clear Ag diffraction peak is discernable in the Ag2O film annealed below 200°C. In comparison, the Ag2O film annealed at 200°C begins to exhibit characteristic Ag diffraction peaks, and in particular the Ag2O film annealed at 250°C can demonstrate enhanced Ag diffraction peaks. This implies that the threshold of the thermal decomposition reaction to produce Ag particles is approximately 200°C for the Ag2O film. In addition, an evolution of the film surface morphology from compact and pyramid-like to a rough and porous structure clearly occurred with increasing annealing temperature. The porous structure might be attributable to the escape of the oxygen produced during annealing, while the rough surface might originate from the reconstruction of the surface. The dispersion of interference peak intensity in the reflectance and transmission spectra could be attributed to the Ag particles produced. The lowered crystallinity and Ag particles produced induce a lattice defect, which results in an enhanced transmissivity in the violet region and a weakened transmissivity in the infrared region. 相似文献
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Microstructure and Optical Properties of AgxO Prepared by Direct-Current Magnetron-Sputtering Method 下载免费PDF全文
Two series of AgxO films are prepared on glass substrates by dc magnetron-sputtering method at room temperature and 90℃ under different oxygen to argon gas ratio (OAR) conditions. The mierostrueture is investigated by XRD and SEM in order to obtain the information on the component evolution of AgO+Ag2O to Ag2O. Its optical properties are investigated by reflectance and absorption spectroscopy to extract the information on metallic and dielectric behaviour evolution of Ag2O, AgO and silver particles and the interband transition. The results indicate that the AgxO film prepared at room temperature is mainly made up of AgO and Ag2 O clusters while Ag2O is the primary component of AgxO prepared at 90℃. The AgxO film mainly consisting of the primary component shows indirect interband transition structure occurring at 2.89eV. Combination of increasing OAR and substrate temperature is an effective method to lower the threshold of thermal decomposition temperature of AgxO and to deal with the bottleneck of short-wavelength optical and magneto-optieM storage. 相似文献
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利用X射线衍射谱(XRD)和X射线光电子谱(XPS)研究了热处理对AgxO样品的结构及成份的影响.研究结果表明所有制备的AgxO样品基本为无定型,并且AgO和Ag2O两种成份共存;两组具有代表性的AgxO样品经过高温热处理后分别呈现了(Ag+Ag2O)和Ag2O的多晶结构,结构及成份的巨大差异与样品制备条件息息相关;AgO和Ag2O两种成份的热分解临界温度分别为200℃和300℃;热处理过程中,伴随着AgxO的热分解及体内的氧原子向样品表面的扩散过程,并且Ag2O具有相对致密的结构. 相似文献
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为提高微晶硅薄膜的纵向结晶性能, 在甚高频等离子体增强化学气相沉积技术的基础上, 采用过渡参数缓变和两步法相结合的方法在普通玻璃衬底上高速沉积薄膜. 当功率密度为2.1 W/cm2, 硅烷浓度在6%和9.6%之间变化时, 从薄膜方向和玻璃方向测算的Raman晶化率的差异维持在2%以内. 硅烷浓度为9.6%时, 薄膜沉积速率可达3.43 nm/s, 从薄膜方向和玻璃方向测算的Raman晶化率分别为50%和48%, 差异的相对值仅为4.0%. 合理控制过渡阶段的参数变化, 可使两个方向的Raman晶化率差值下降到一个百分点. 表明采用新方法制备薄膜, 不仅可以抑制非晶孵化层的形成, 改善微晶硅薄膜的纵向结构, 还为制备优质薄膜提供了较宽的参数变化空间.
关键词:
微晶硅薄膜
非晶孵化层
高速沉积
甚高频等离子体增强化学气相沉积 相似文献