Defocusing image to pattern contact holes using attenuated phase shift masks

The patterning of contact holes by selecting out-of-focus image plane (defocus) using attenuated phase shift masks (APSM) has been studied. Defocus is found to enhance the image modulation at low partial coherence for contact holes with negative local average of mask function. Semi-dense holes up to 130 nm in 8% APSM have been printed by 0.5 μm defocus at a partial coherence of 0.31 using KrF scanner with highest numerical aperture of 0.68. However, these holes were closed with in-focus imaging. Defocus is also found to be beneficial for patterning the pitches that have extensive side lobes with in-focus imaging.     

Enantiomeric synthesis of the key synthon of the oviposition-deterring pheromone of Rhagoletis cerasi L

A convenient and enantioselective synthesis of ethyl (8RS, 15R)-8-acetoxy-15-hydroxyhexadecanoate15 via a chemoenzymatic approach has been described. The salient features of the synthesis were operational simplicity, use of easily accessible materials, and excellent enantiocontrol via lipase catalyzed acetylation of 2-alkanol.