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Magnetic skyrmions are topologically protected spin textures that are being investigated for their potential use in next generation magnetic storage devices. Here, magnetic skyrmions and other magnetic phases in Fe1?xCoxGe (x < 0.1) microplates (MPLs) newly synthesized via chemical vapor deposition are studied using both magnetic imaging and transport measurements. Lorentz transmission electron microscopy reveals a stabilized magnetic skyrmion phase near room temperature (≈280 K) and a quenched metastable skyrmion lattice via field cooling. Magnetoresistance (MR) measurements in three different configurations reveal a unique anomalous MR signal at temperatures below 200 K and two distinct field dependent magnetic transitions. The topological Hall effect (THE), known as the electronic signature of magnetic skyrmion phase, is detected for the first time in a Fe1?xCoxGe nanostructure, with a large and positive peak THE resistivity of ≈32 nΩ cm at 260 K. This large magnitude is attributed to both nanostructuring and decreased carrier concentrations due to Co alloying of the Fe1?xCoxGe MPL. A consistent magnetic phase diagram summarized from both the magnetic imaging and transport measurements shows that the magnetic skyrmions are stabilized in Fe1?xCoxGe MPLs compared to bulk materials. This study lays the foundation for future skyrmion‐based nanodevices in information storage technologies.  相似文献   
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Over the past few decades, significant progress has been made in the field of photonic processing of electronic materials using a variety of light sources. Several of these technologies have now been exploited in conjunction with emerging electronic materials as alternatives to conventional high‐temperature thermal annealing, offering rapid manufacturing times and compatibility with temperature‐sensitive substrate materials among other potential advantages. Herein, recent advances in photonic processing paradigms of metal‐oxide thin‐film transistors (TFTs) are presented with particular emphasis on the use of various light source technologies for the photochemical and thermochemical conversion of precursor materials or postdeposition treatment of metal oxides and their application in thin‐film electronics. The pros and cons of the different technologies are discussed in light of recent developments and prospective research in the field of modern large‐area electronics is highlighted.  相似文献   
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With only two matched processing steps, the fabrication of thick nanoporous alumina membranes with mono‐oriented, perfect hexagonal packing of pores, and precise control of all structural parameters over large areas is demonstrated. The cylindrical pores are uniform in shape and widely tunable in their dimensions and spatial distribution, with aspect ratios as high as 500. In brief, electropolished aluminum is first patterned using three‐beam interference lithography in a single step and then anodized in a hard regime. The periodic concavities in the aluminum surface guide the pore nucleation, and the self‐ordering phenomenon guarantees the maintenance of the predefined arrangement throughout the entire layer. In contrast to other methods, the interpore distance can be easily adjusted, the porous layer is not limited in thickness, no prefabricated stamps are involved, and the periodic pattern can be easily reproduced without risk of degradation. The approach overcomes the time, cost, and scale limitations of other existing processes. These membranes are well‐suited for the templated fabrication of perfectly ordered arrays of highly uniform 1D nanostructures. Thus, the application fields of these functional membranes are diverse: magneto‐optical and opto‐electronic devices, photonic crystals, solar cells, fuel cells, and chemical and biochemical sensing systems, to name a few.  相似文献   
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