Planar lightwave integrated circuits with embedded actives for board and substrate level optical signal distribution

This paper explores design options for planar optical interconnections integrated onto boards, discusses fabrication options for both beam turning and embedded interconnections to optoelectronic devices, describes integration processes for creating embedded planar optical interconnections, and discusses measurement results for a number of integration schemes that have been demonstrated by the authors. In the area of optical interconnections with beams coupled to and from the board, the topics covered include integrated metal-coated polymer mirrors and volume holographic gratings for optical beam turning perpendicular to the board. Optical interconnections that utilize active thin film (approximately 1-5 /spl mu/m thick) optoelectronic components embedded in the board are also discussed, using both Si and high temperature FR-4 substrates. Both direct and evanescent coupling of optical signals into and out of the waveguide are discussed using embedded optical lasers and photodetectors.     

Quasi-bound states determination using a perturbed wavenumbersmethod in a large quantum box

A perturbed wavenumbers method (PWM) is presented that is capable of determining the quasi-bound-state eigenenergies and their lifetimes for quantum heterostructures having arbitrary potential profiles. The numerical method presented solves the single-band effective-mass Schrodinger equation without using complex energies. It is applicable to quantum structures that are symmetric, asymmetric, unbiased, or biased. For multiple quantum heterostructures, extensive comparisons of this numerical method with other currently used techniques are included. In addition, a modified density of states formulation is presented and applied to these example cases     

Architectural issues related to the optical implementation of an EGS network based on embedded control

Free-space optical implementations of switching networks have been proposed to circumvent many of the system-level problems that may be encountered in systems that require many high-density, high-bandwidth connections. The details of a new class of switching network (the EGS network), that is well-suited to free-space implementations, is described. The common control injection problem that plagues most free-space photonic networks, i.e. how can control information from an electronic source be injected into the network for applications that require relatively high network reconfiguration rates, is examined. A new technique for control injection, called embedded control, which permits network operation even with relatively high network reconfiguration rates is also proposed.     

Water-soluble oligomer dimers based on paracyclophane: a new optical platform for fluorescent sensor applications

Water soluble paracyclophane chromophore dimers provide optical reporters that show little sensitivity to surfactants and thus are ideal for biosensor design. Strong intramolecular delocalization circumvents complications from intermolecular delocalization in spontaneously formed aggregates. The synthesis of 2 involves a novel TBAT deprotection/butane sultone ring-opening sequence, which should be general for the preparation of water-soluble conjugated oligomers and polymers.     

Donor–acceptor complexes in copolymerization. XLIX. Cationic polymerization of donor monomers in presence of polar solvents and acrylic monomers. A revised mechanism for polymerization of comonomer complexes

α-Methylstyrene (MS) and isobutyl vinyl ether (VE) readily polymerize, styrene (S) polymerizes to a small extent, and isobutylene (IB), butadiene (BD), and isoprene (IP) fail to polymerize in the presence of catalytic amounts of AlCl₃ when propionitrile, ethyl propionate, and methyl isobutyrate are used as reaction media. MS polymerizes readily and S polymerizes with difficulty in the presence of AlCl₃ to yield homopolymers when acrylonitrile (AN) is present and copolymers with ethyl acrylate (EA) and methyl methacrylate (MMA). VE readily homopolymerizes, while IB, BD, and IP fail to polymerize in the presence of AlCl₃ and the acrylic monomers. VE readily homopolymerizes, S and MS polymerize to a very small extent, and IB, BD, and IP do not polymerize in the presence of ethylaluminum sesquichloride (EASC) in polar solvents. VE readily homopolymerizes in the presence of EASC and the acrylic monomers. MS polymerizes to a small extent in the presence of EASC and the acrylic monomers to yield equimolar copolymers with EA and MMA and a mixture of cationic homopolymer and equimolar copolymer with AN. S yields equimolar copolymers in low yield in the presence of EASC and the acrylic monomers. IB, BD, and IP in the presence of EASC do not polymerize to any significant extent when EA is present, form AN-rich copolymers and yield poly(methyl methacrylate) in the presence of MMA. A revised mechanism is presented for the formation of cationic, radical, random, and alternating copolymers as well as alternating copolymer graft copolymers in the copolymerization of donor and acceptor monomers.     

Donor–acceptor complexes in copolymerization. XLIII. Cyclization of alternating and random styrene–(meth)acrylic ester copolymers

Equimolar alternating copolymers of styrene and methyl methacrylate (prepared with Et_1.5AlCl_1.5, SnCl₄, and ZnCl₂) as well as equimolar random copolymer were treated with polyphosphoric acid at 135°C. The extent of cyclization of the alternating copolymers was about 40%, independent of the cotacticity of the copolymer, and there was little or no crosslinking. The random copolymer underwent only 10% cyclization and considerable crosslinking. The extent of cyclization of the alternating copolymer of styrene and methyl acrylate (prepared with Et_1.5AlCl_1.5) was the same as that of the random copolymer and was lower than that of the corresponding methyl methacrylate copolymer. Both alternating and random copolymers underwent extensive crosslinking.     

Donor-Acceptor Complexes in Copolymerization. IX. Kinetic Features of Copolymerization of Styrene and Methyl Methacrylate… Al(C2H5))1.5Cl1.5

The kinetic features of the copolymerization of styrene and methyl methacrylate in the presence of ethylaluminum sesquichloride in toluene do not unequivocally distinguish between first- and second-order reactions. The reaction does not attain steady-state conditions. The course of the reaction is apparently influenced by many factors including the dissociation of the polymerizable complex into unreactive monomeric species and physical phenomena such as diffusion and dilution effects as well as matrix formation. The use of azobisisobutyronitrile as an initiator indicates apparent bimolecu-lar termination but the kinetic curves show deviation from linearity.     

Proposed Participation of Excited Monomer in the Free Radical-Catalyzed High Pressure,High Temperature Polymerization of Ethylene

The radiation-induced copolymerization of ethyl vinyl ether with dibutyl maleate was investigated over a wide range of comonomer compositions, dose rates, and in the temperature range from ?25 to 75° C. Both the rates of copolymerization and the molecular weights of the resulting copolymers were found to depend strongly on the initial comonomer composition, both reaching a maximum value at an equimolar comonomer composition. A copolymer was obtained in which the co-monomers alternate with regularity along the polymer chain over the entire range of comonomer compositions investigated. The monomer reactivity ratios were determined and found to be practically zero. The apparent activation energy was found to change at 35° C, the boiling point of the ethyl vinyl ether, from a value of 10.48 kJ/mole to a value of 18.86 kJ/mole above this temperature. This phase change also resulted in a marked decrease in the molecular weights of the copolymers formed above 35° C. The dose-rate dependence of the rate of copolymerization was found to be 0.70 over the dose-rate range     

Donor-Acceptor Complexes in Copolymerization. XXVI. Effect of Solvent,Temperature, and Complexing Agent on the Polymerization of Comonomer Charge Transfer Complexes

The copolymerization of styrene with methyl methacrylate (S/MMA = 4/1) or acrylonitrile (S/AN = 1/1) in the presence of ethylaluminum sesquichloride (EASC) yields 1/1 copolymer in toluene or chlorobenzene. In chloroform the S-MMA-EASC polymerization yields 60/40 copolymer while the S-AN-EASC polymerization yields 1/1 copolymer. In the presence of EASC, styrene-α-chloroacrylonitrile yields 1/1 copolymer (DMF or DMSO), S-AN yields 1/1 copolymer (DMSO) or radical copolymer (DMF), S-MMA yields radical copolymer (DMF or DMSO), α-methylstyrene-AN yields radical copolymer (DMSO) or traces of copolymer (DMF), and α-MS-methacrylo-nitrile yields traces of copolymer (DMSO) or no copolymer (DMF). When zinc chloride is used as complexing agent in DMF or DMSO, none of the monomer pairs undergoes polymerization. However, radical catalyzed polymerization of isoprene-AN-ZnCl₂ in DMF yields 1/1 alternating copolymer. The copolymerization of S/MMA in the presence of EASC yields 1/1 alternating copolymer up to 100°C, while the copolymerization of S/AN deviates from 1/1 alternating copolymer above 50°C. The copolymerization of S/MMA deviates from 1/1 copolymer at MMA/EASC mole ratios above 20 while the copolymerization of S/AN deviates from 1/1 copolymer at MMA/EASC ratios above 50.