A modern approach to the solution and analysis of the Simha-Somcynsky model for the description of pressure-volume-temperature properties of polymer fluids

We revisit the Simha-Somcynsky model of polymer fluids with the purpose of developing novel theoretical and computational approaches to simplify and speed up its solution as well as the fitting of experimental data, and decrease its level of mathematical complexity. We report a novel method that allows us to solve one of the two equations of the model exactly, thus putting the level of mathematical difficulty on a par with the one of other models for polymer fluids. Moreover, we describe a computational algorithm capable of fitting all five parameters of the model in an unbiased way. The results obtained reproduce literature results and fit experimental pressure-volume-temperature and solubility parameter data for three polymers very accurately. Moreover, the new techniques allow for the investigation of the model at very low temperatures. Unexpectedly, the model predicts behaviors that could be interpreted as a glass transition, as routinely observed in dilatometry and differential scanning calorimetry, and a glass phase. We compared the predicted and experimental T g’s for cis poly(1,4-butadiene) and found an excellent quantitative agreement.     

H.264——新一代的视频编码标准

H．264是国际电联最新通过的新一代甚低码率视频编码标准。本文旨在阐述H．264视频编码标准的关键技术。并介绍其在视频会议中的应用。     

关于数学教学的若干思考（待续）

关于数学教学的若干思考（待续）４３００８０武钢三中钱展望编者按：钱展望老师系湖北省著名的特级教师，全国教育系统劳动模范，“五一劳动奖章”获得者，有突出贡献的数学奥林匹克国家高级教练，前不久又被国务院批准为享受政府特殊津贴的教育专家．《关于数学教学的若...     

非保守系统的2π-周期解

本文利用R.Reissig的摄动引理的推广形式,讨论了高维非保守系统的2π-周期解的存在性和唯一性,得到了比较完整的定理。并进一步给出了(1)的带摄动项的系统的2π-期解的存在性定理。因而推广了S.Ahmad和J.Salazer,王铎,L.Amaral和M.P.Pera的相应结果。     

用有限元结合动态光弹性分析确定动态应力强度因子

本文运用有限元方法结合动态光弹性分析,对动态应力强度因子的计算进行了分析研究.作者在钱伟长教授[1]的基础上,将动态裂尖的奇异性分析解引入有限元计算;并以动态光弹性分析所得的裂纹扩展长度与时间的关系曲线作为定解补充条件,据此建立了有效模拟裂纹扩展的数值模型.通过具体算例证明,本文的方法取得了与实验结果相吻合的效果.     

超大规模集成电路中任意形状掩模边缘附近的离子分布

离子注入过程中,注入离子在掩模边缘附近的分布决定MOS晶体管漏极区域处的电场强度,计算了70keV硼离子注入硅样品中不同掩模边缘离子密度等线,考虑了四阶矩下的杂质深度分布(无掩模情况)。合理选择掩模蚀刻工艺,可获得均匀性,高抗噪声度的器件中。同时也指出了太薄掩模材料对注入离子分布的影响。