A superjunction structure using high-k insulator for power devices: theory and optimization

A superjunction (SJ) structure using a high-k (Hk) insulator is studied and optimized by using an analytic model. Results by using the proposed model match well with that of numerical calculations. Numerical calculation results show that, only needing an Hk insulator with a permittivity of ε_I=5ε_S, the optimum specific on-resistance of the MOSFET applying the proposed structure is about 8%-20% lower than that of the conventional SJ-MOSFET with V_B=200-1000 V. An example with V_B=400 V shows that, the permissible error range of doping concentration of the p-region to maintain above 80% of V_B is from -37% to +32% for the former and is only from -13% to +13% for the latter.     

环境温度对HfO2铁电存储器的质子辐照效应影响研究

基于HfO₂的铁电随机存取存储器(FeRAM)具有功耗低、存取速度快,易于小型化,抗干扰能力强等优势,在航天航空领域有广袤的发展空间。然而,FeRAM在太空环境下的抗辐照性能尚未得到全面的研究。研究了W/TiN/Hf0.5Zr0.5O₂(HZO)/TiN铁电存储器在常温和高温环境下经5 MeV质子辐照后的电学特性和铁电畴结构变化。通过电学和压电响应力显微镜(PFM)手段表征发现,在常温质子辐照后,电容器的介电常数(ε_r)和剩余极化强度(P_r)值均增大,器件的铁电性能提升,常温高注量质子辐照有利于存储器在太空环境中工作,但随着辐照时环境温度升高,HZO存储器的铁电性能下降,漏电流增大,铁电存储器的各项性能明显退化。     

齐纳二极管电子辐照特性研究

研究了电子辐照前后齐纳二极管在不同温度下的直流参数特性以及其动态响应。根据直流伏安特性提取齐纳管理想因子n,发现高注量下n有明显增大,表明辐照引入了复合中心。该器件室温下的直流参数稳定,辐照引起的变化不明显;较高温度下,击穿电压和正向压降等变化稍大。在动态响应的研究中,瞬态电压消失后,电流迅速减小并产生了随时间衰减的振荡。高注量的样品振荡时间相较于低注量的样品有明显的延长,这个延长在器件室温存放之后发生了消退。