有机聚合物太阳电池电极的表面性能研究

采用多种方法对有机聚合物电池的电极进行表面处理,在测量接触角的基础上,应用几何平均法计算了电极样品的表面能和极性度,研究了处理方法对电极表面润湿性能的影响。结果表明,电极表面性能与其处理方法密切相关,等离子处理具有最小的接触角、最大的表面能和极性度,有效增强了电极表面的润湿性能,这一结果对于优化电极/活性层的界面性质,改善有机聚合物太阳电池的光伏性能具有非常重要的作用。     

热处理对活性层性质及有机光伏电池性能的影响

制备了MEH-PPV活性层薄膜及其器件,通过AFM、透射光谱和伏安特性测量研究了热处理对薄膜表面性质及其光电性能的影响。结果表明热处理降低了表面粗糙度,减小了禁带宽度和电阻率,提高了载流子迁移率。薄膜表面性质以及光电性能的优化,有利于增加有机光伏电池的短路电流、开路电压和填充因子,提高其能量转换效率,改善电池的器件性能。     

有机/聚合物异质结电致发光器件的光电性能

器件结构是影响有机发光器件(OLED)性能的重要因素之一.采用8-hydroxyquinoline-aluminum(AlQ)作为发光层(EML)和电子传输层(ETL),polyvinylcarbazole (PVK)作为空穴传输层(HTL),制备了具有有机小分子/聚合物异质结结构的OLED器件,通过其电压-电流-发光亮度(V-J-B)特性测试,研究了HTL的引入及其膜厚对器件性能的影响.实验结果表明,HTL的引入有效地改善了OLED的光电性能,同时HTL膜厚对器件性能具有显著影响,当HTL膜厚为20 nm时,所制备的OLED器件具有最小的驱动电压和启亮电压、最大的发光亮度和发光效率.

Abstract：

The device construction plays an important role in improving the optoelectronic performance of organic electroluminescence devices (OLEDs). Heterojunction OLEDs with a configuration of glass/ITO/PVK/AlQ/Mg/Al were fabricated by using 8-hydroxyquinoline-aluminum (AlQ) as the emission layer (EML) and electron transport layer (ETL) and polyvinylcarbazole (PVK) as the hole transport layer (HTL). The effect of the HTL thickness on the performance of OLEDs was investigated with respect to the driving voltage, turn-on voltage, electroluminescence brightness and efficiency of the devices. Experimental results demonstrate that the optical and electrical properies of OLEDs are closely related to the HTL thickness. The device fabricated with the HTL thickness of 20 nm possesses the best photoelectric properties such as the minimum driving voltage and turn-on voltage, and the maximum electroluminescence brightness and efficiency.     

ZAO透明导电薄膜微观结构和光电性能的研究

以ZnAl2O4陶瓷靶为靶材,采用射频磁控溅射法制备了掺铝氧化锌(ZAO)透明导电薄膜,通过XRD、SEM、四探针仪和分光光度计等测试,研究了沉积温度对薄膜结构、形貌、力学和光电性能的影响.结果表明:ZAO具有(002)择优取向的六角纤锌矿结构,沉积温度对薄膜性能具有明显影响,当温度位于370～ 400℃区间时,薄膜的结晶质量较好、电阻率较低、可见光波段的平均透射率较高,其品质因数大于1.20×10-2S,具有良好的光电综合性能.同时基于透射光谱计算了ZAO薄膜的光学常数,并用有效单振子理论解释了薄膜的折射率色散关系.     

钛掺杂对ZnO∶Ti透明导电薄膜性能的影响

以不同钛掺杂含量的氧化锌陶瓷靶作为溅射源材料,采用射频磁控溅射工艺在玻璃基片上沉积了Ti掺ZnO(TZO)透明导电薄膜,通过XRD、XPS、分光光度计和霍尔效应测试系统,研究了钛掺杂含量对TZO薄膜微观结构和光电特性的影响.结果表明:所有TZO薄膜均为六角纤锌矿结构,并且具有(002)择优取向,钛掺杂含量对薄膜性能具有明显的影响.当钛掺杂含量为3wt;时,TZO薄膜的结晶质量最好、可见光平均透过率最高、电阻率最低、品质因数最大(748.15 S/cm),具有最佳的光电综合性能.TZO薄膜的光学带隙随钛掺杂含量增加而单调增大.     

Microstructure and optoelectronic properties of gallium- titanium-zinc oxide thin films deposited by magnetron sputtering

Gallium-titanium-zinc oxide(GTZO) transparent conducting oxide(TCO) thin films were deposited on glass substrates by radio frequency magnetron sputtering. The dependences of the microstructure and optoelectronic properties of GTZO thin films on Ar gas pressure were observed. The X-ray diffraction(XRD) and scanning electron microscopy(SEM) results show that all the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. With the increment of Ar gas pressure, the microstructure and optoelectronic properties of GTZO thin films will be changed. When Ar gas pressure is 0.4 Pa, the deposited films possess the best crystal quality and optoelectronic properties.     

Fabrication and characterization of transparent conducting titanium-zinc oxide nanostructured thin films

Nano transparent conducting titanium-zinc oxide (Ti-ZnO) thin films were prepared on glass substrates by radio frequency (RF) magnetron sputtering technique. The deposited films are characterized by X-ray diffraction (XRD), four-probe meter and UV-visible spectrophotometer. The effects of Ti-doping content on the structural, optical and electrical properties of the films are investigated. The XRD results show that the obtained films are polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. The structural and optoelectronic characteristics of the deposited films are subjected to the Ti-doping content. The Ti-ZnO sample fabricated with the Ti-doping content of 3% (weight percentage) possesses the best crystallinity and optoelectronic performance, with the highest degree of preferred (002) orientation of 99.87%, the largest crystallite size of 83.2 nm, the minimum lattice strain of 6.263´10-4, the highest average visible transmittance of 88.8%, the lowest resistivity of 1.18×10-3 W?cm and the maximum figure of merit (FOM) of 7.08×103 W-1?cm-1. Furthermore, the optical bandgaps of the films are evaluated by extrapolation method and observed to be an increasing tendency with the increase of the Ti-doping content.     

聚合物太阳电池光敏薄膜的物理化学性质研究

采用不同化学溶剂制备了聚合物太阳电池的光敏层薄膜,通过接触角测试和表面自由能参数计算,研究了化学溶剂与光敏薄膜物理化学性质之间的关系.实验结果显示,用四氢呋喃溶液制备的光敏薄膜具有较大的表面极性度和极性分量;化学溶剂通过影响聚合物链的聚集状态,进而在一定程度上影响光敏薄膜的性质.另外,分析讨论了化学溶剂对电极/光敏层界面形成及其太阳电池性能的影响.研究结果表明,成膜溶剂的合理选择对于优化聚合物太阳电池的性能是至关重要的.     

磁控溅射沉积掺锡氧化铟透明导电薄膜的光电性能研究

采用直流磁控溅射技术在玻璃衬底上制备了掺锡氧化铟(ITO)透明导电薄膜,通过XRD、XPS、四探针仪和分光光度计等测试方法,研究了沉积速率对ITO薄膜微观结构和光电性能的影响.实验结果表明:ITO样品为具有(222)择优取向的立方锰铁矿结构,其晶体结构和光电性能明显受到沉积速率的影响.当沉积速率为4 nm/min时,所制备的ITO薄膜具有最大的晶粒尺寸(32.5 nm)、最低的电阻率(1.1×10-3Ω·cm)、最高的可见光区平均透过率(86.4;)和最大的优良指数(7.9×102 S·cm-1),其光电综合性能最佳.同时采用Tauc法则计算了ITO薄膜的光学能隙,结果显示沉积速率增大时,ITO薄膜的光学能隙单调减小.     

镓掺杂氧化锌透明导电薄膜的制备及其性能研究

采用射频磁控溅射方法在玻璃基片上制备了镓掺杂氧化锌(Ga∶ ZnO)透明导电薄膜,通过XRD、XPS、四探针仪和分光光度计等表征技术,研究了衬底温度对Ga∶ ZnO薄膜结构、组分、光学和电学性质的影响.结果表明:所有样品均为具有(002)择优取向的高质量透明导电薄膜,其晶体结构和光电性能与衬底温度密切相关.当衬底温度为673 K时,所制备的Ga∶ ZnO薄膜具有最大的晶粒尺寸(72.6 nm)、最低的电阻率(1.3×10-3Ω·cm)、较高的可见∶ZnO薄膜的光学能隙,结果显示随着衬底温度的升高,薄膜的光学能隙单调增加.