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1.
Effect of Reactor Pressure on Qualities of GaN Layers Grown by Hydride Vapour Phase Epitaxy 下载免费PDF全文
The influence of reactor pressure on GaN layers grown by hydride vapour phase epitaxy (HVPE) is investigated. By decreasing the reactor pressure from0. 7 to 0.5 mm, the GaN layer growth mode changes from the island-like one to the step flow. The improvements in structural and optical properties and surface morphology of GaN layers are observed in the step flow growth mode. The results clearly indicate that the reactor pressure, similarly to the growth temperature, is One of the important parameters to influence the qualities of GaN epilayers grown by HVPE, due to the change of growth mode. 相似文献
2.
使用分子束外延方法,采用In束流保护下的调制中断生长技术,在(0001)蓝宝石衬底上生长GaN薄膜.利用反射式高能电子衍射(RHEED)对生长进行实时监控,并用扫描电子显微镜(SEM)、原子力显微镜(AFM)和X射线衍射(XRD)法对GaN外延薄膜的表面形貌和晶体质量进行分析.实验结果表明:采用该技术生长的Ga极性GaN外延薄膜中的晶体表面残留Ga滴密度大大降低,GaN外延薄膜的表面形貌得到改善,其均方根粗糙度(RMS)由3nm降低为0.6nm,同时XRD双晶摇摆曲线测试的结果表明,GaN外延层的晶格质量也得到改善. 相似文献
3.
Theoretical Analysis of Current Crowding Effect in Metal/AIGaN/GaN Schottky Diodes and Its Reduction by Using Polysilicon in Anode 下载免费PDF全文
There exists a current crowding effect in the anode of AIGaN/GaN heterojunction Schottky diodes, causing local overheating when working at high power density, and undermining their performance. The seriousness of this effect is illustrated by theoretical analysis. A method of reducing this effect is proposed by depositing a polysilicon layer on the Schottky barrier metal. The effectiveness of this method is provided through computer simulation. Power consumption of the polysilicon layer is also calculated and compared to that of the Schottky junction to ensure the applicability of this method. 相似文献
4.
Effect of Ⅲ/Ⅴ Ratio of HT-AIN Buffer Layer on Polarity Selection and Electrical Quality of GaN Films Grown by Radio Frequency Molecular Beam Epitaxy 总被引:1,自引:0,他引:1 下载免费PDF全文
We investigate the effect of A/N ratio of the high temperature (HT) AIN buffer layer on polarity selection and electrical quality of GaN films grown by radio frequency molecular beam epitaxy. The results show that low Al/N ratio results in N-polarity GaN films and intermediate Al/N ratio leads to mixed-polarity GaN films with poor electrical quality. GaN films tend to grow with Ga polarity on Al-rich AIN buffer layers. GaN films with different polarities are confirmed by in-situ reflection high-energy electron diffraction during the growth process. Wet chemical etching, together with atomic force microscopy, also proves the polarity assignments. The optimum value for room-temperature Hall mobility of the Ga-polarity GaN film is 703cm^2/V.s, which is superior to the N-polarity and mixed-polarity GaN films. 相似文献
5.
使用分子束外延方法,采用In束流保护下的调制中断生长技术,在(0001)蓝宝石衬底上生长GaN薄膜.利用反射式高能电子衍射(RHEED)对生长进行实时监控,并用扫描电子显微镜(SEM)、原子力显微镜(AFM)和X射线衍射(XRD)法对GaN外延薄膜的表面形貌和晶体质量进行分析.实验结果表明:采用该技术生长的Ga极性GaN外延薄膜中的晶体表面残留Ga滴密度大大降低,GaN外延薄膜的表面形貌得到改善,其均方根粗糙度(RMS)由3nm降低为0.6nm,同时XRD双晶摇摆曲线测试的结果表明,GaN外延层的晶格质量也得到改善. 相似文献
6.
Growth of Strain Free GaN Layers on (0001) Oriented Sapphire by Using Quasi-Porous GaN Template 总被引:1,自引:0,他引:1 下载免费PDF全文
We report the reduced-strain gallium-nitride (GaN) epitaxial growth on (0001) oriented sapphire by using quasiporous GaN template. A GaN film in thickness of about 1 μm was initially grown on a (0001) sapphire substrate by molecular beam epitaxy. Then it was dealt by putting into 45% NaOH solution at 100℃ for lOmin. By this process a quasi-porous GaN film was formed. An epitaxial GaN layer was grown on the porous GaN layer at 1050℃ in the hydride vapour phase epitaxy reactor. The epitaxial layer grown on the porous GaN is found to have no cracks on the surface. That is much improved from many cracks on the surface of the GaN epitaxial layer grown on the sapphire as the same as on GaN buffer directly. 相似文献
7.
研究了原位退火对用氢化物外延方法在(0001)面蓝宝石衬底上生长的氮化镓(GaN)外延薄膜的结构和光学性能的影响.测试表明,氨气气氛下在生长温度进行的原位退火,明显提高了GaN外延膜的质量.X射线衍射(XRD)分析表明,随着原位退火时间的增加,(0002)面和(1012)面摇摆曲线的半峰宽逐渐变窄.喇曼散射谱显示样品退火后E2(high)峰位向低频区移动;随着退火时间的延长,趋向于块状GaN的峰位.可见,原位退火使GaN外延膜中的双轴应力明显减少.光致发光的测试结果与XRD和喇曼散射谱的结论一致.表明原位退火能有效提高GaN外延膜的结构和光学性能. 相似文献
8.
Effect of Crucibles on Qualities of Self-Seeded Aluminium Nitride Crystals Grown by Sublimation 下载免费PDF全文
Self-seeded aluminium nitride (AlN) crystals are grown in tungsten and hot pressed boron nitride (HPBN) crucibles with different shapes by a sublimation method. The qualities of the AlN crystals are characterized by high-resolution transmission electronic microscopy (HRTEM), scanning electron microscopy (SEM) and Micro-Rarnan spectroscopy. The results indicate that the better quality crystals can be collected in conical tungsten crucible. 相似文献
9.
This paper reports on N-, mixed-, and Ga-polarity buffer layers are
grown by molecular beam epitaxy (MBE) on sapphire (0001) substrates,
with the GaN thicker films grown on the buffer layer with different
polarity by hydride vapour epitaxy technique (HVPE). The surface
morphology, structural and optical properties of these HVPE-GaN
epilayers are characterized by wet chemical etching, scanning
electron microscope, x-ray diffraction, and photoluminescence
spectrum respectively. It finds that the N-polarity film is unstable
against the higher growth temperature and wet chemical etching, while
that of GaN polarity one is stable. The results indicate that the
crystalline quality of HVPE-GaN epilayers depends on the polarity of
buffer layers. 相似文献
10.
GaN layers with different polarities prepared by radio frequency molecular beam epitaxy and characterized by Raman scattering 下载免费PDF全文
GaN layers with different polarities have been prepared by radio-frequency
molecular beam epitaxy (RF-MBE) and characterized by Raman
scattering. Polarity control are realized by controlling
Al/N flux ratio during high temperature AlN buffer growth. The Raman results
illustrate that the N-polarity GaN films have frequency shifts at $A_{1}$(LO)
mode because of their high carrier density; the forbidden $A_{1}$(TO) mode
occurs for mixed-polarity GaN films due to the destroyed translation
symmetry by inversion domain boundaries (IDBS); Raman spectra for
Ga-polarity GaN films show that they have neither frequency shifts mode nor forbidden
mode. These results indicate that Ga-polarity GaN films have a better
quality, and they are in good agreement with the results obtained from the
room temperature Hall mobility. The
best values of Ga-polarity GaN films are 1042 cm$^{2}$/Vs with a carrier
density of 1.0$\times $10$^{17}$~cm$^{ - 3}$. 相似文献