用于高速GaAs IC在片检测的电光取样系统

目前直接电光取样技术是在片检测砷化镓高速集成电路内部动态特性的最好方法。我们建立了半导体激光器电光取样系统，测试了梳状信号发生器输出的４３．７ｐｓ的电脉冲信号以及频率５ＧＨｚ的微波信号，并测试了频率３ＧＨｚ的微波信号的位相移动或时间延迟以及铁氧体微波移相器的静态特性曲线，这个系统将被应用于砷化镓高速集成电路内部动态特性在片检测。     

立方氮化硼单晶紫外吸收光谱的研究

对于在高温、高压下合成的人工立方氮化硼(cBN)片状单晶进行了紫外吸收光谱和第一性原理的能带结构研究。实验中采用了UV WINLAB光谱分析仪,数据分析由MOLECULAR SPECTROSCOPY软件进行拟合运算,通过特殊的石英夹具对样品的测试表明cBN的紫外吸收波长限为198 nm,带隙为6.26 eV。结合第一性原理计算的cBN的能带结构和电子态密度的计算,可以证实导致紫外光吸收的过程是价带电子吸收光子到导带的间接跃迁。文章实验结果与目前报道的cBN能带结构中禁带宽度的吻合较好,表明cBN具有良好的紫外特性,是一种具有发展前景的紫外光电和高温半导体器件材料。     

硅材料外加直流电场诱导的线性电光效应

在直流电场作用下,硅单晶的反演对称性被破坏,从而诱导产生二阶非线性光学效应.主要研究了硅材料在外加直流电场作用下诱导产生的场致线性电光效应.以沿(111)面切割的近本征硅材料为样品,采用平行板电容器结构,通过横向电光调制实验,观测到在不同直流偏压下,电光信号随调制电压而线性增加,且直流偏压越大,电光信号增加的斜率越大....     

Absorption Related to Electrochromism in Cubic Boron Nitride Single Crystals

A unusual electrochromism is observed in amber cubic boron nitride （cBN） single crystals when breakdown possibly related to impurities and defects occurs. The electrochromism induces an abrupt increase in the absorption coefficient of the cBN crystals within the visible and infrared region. The change of the absorption coefficient of cBN crystal can be increased linearly by raising the current after the electrochromism occurs, whereas it is irrelevant to the polarization of the incident light. The absorption related to the electrochromism in the cBN single crystal has potential applications in designing and manufacturing electro-optical modulators, optical switches, and other optoelectric devices.     

[110]晶向近本征硅单晶双光子吸收各向异性

以沿[110]晶向切割的近本征硅单晶为样品,通过研究样品对连续波固体激光器所产生的1.3μm的近红外光的双光子吸收所诱导的光电流对入射光偏振方向的依赖关系,研究了双光子吸收的各向异性.测得了硅单晶对该波长的光的三阶极化率张量χ(3)的各向异性系数为-0.25,两个独立分量的比值χxxxx/χxxyy的幅度为2.4,并基于前期工作所得的χxxyy的结果,进而确定了另一分量χxxxx的值大约为1.49×10-19m2/V2.     

用电调制反射光谱的方法确定能带中临界点的位置

本文用通常的仪器和简单的方法,测量了半导体材料的电调制反射光谱,从而确定出能带中临界点的位置。其特点是把半导体二极管作为光电倍增管的负载以自动实现交、直流两种讯号相除的方法,测量了反射的相对调制(ΔR)/(R),并给出了由测量过程本身自洽地确定二极管的有效动态电阻区的方法。     

砷化镓共面波导内部微波信号的电光取样检测

本文报道了共轴反射式电光取样系统。该系统时间分辨率不低于20ps,空间分辨率不低于3m。用它检测了砷化镓共面波导内部的微波信号。这套系统将被应用于砷化镓高速集成电路内部特性的在片检测。     

Quadratic nonlinear response to 1.56-μm continuous wave laser in semi-insulating GaAs

The nonlinear photoresponse to a 1.56μm infrared continuous wave laser in semi-insulating （SI） galliu- marsenide （GaAs） is examined. The double-frequency absorption （DFA） is responsible for the nonlinear photoresponse based on the quadratic dependence of the photocurrent separately on the coupled optical power and bias voltage. The electric field-induced DFA remarkably affects the native DFA in SI GaAs. The surface electric field or the surface band-bending of SI GaAs significantly affects the magnitude variation of the Dhotocurrent and dark current     

Experimentally distinguishing electro-optic effects in silicon

Different electro-optic effects, such as Kerr effect, Pockels effect induced by the electric field or strain, and plasma dispersion effect exist in silicon. Experimentally distinguishing these effects is necessary for designing silicon-based electro-optic devices. According to their different polarization dependencies and frequency responses, these effects are measured and distinguished successfully via a transverse electro-optic modulation experiment based on the near-intrinsic silicon sample. The results indicate that Pockels effect induced by the electric field or strain is primary among these effects in the near-intrinsic silicon sample.