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基于最新的CF/CF 3.0协议,设计了一款基于AHB总线的可配置的CF/CF 卡控制器.设计采用了高性能乒乓操作方式的改进异步FIFO.针对CF/CF 卡实际使用时往往只需要其某一两种模式的特点,采用了一种可定制可裁剪CF/CF 控制器电路的设计思路,极大地提高设计效率;探讨了一种基于SoC高性能接口控制器电路通用体系架构,已成功应用到多种接口控制器的设计中.设计通过了仿真(NC-Verilog)、综合(DC)以及FPGA验证,嵌入到单板系统中,实现了与CF存储卡之间的数据传输. 相似文献
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The fabrication of enhancement-mode AlGaN/GaN HEMTs by fluorine plasma treatment on sapphire substrates is reported. A new method is used to fabricate devices with different fluorine plasma RF power treatments on one wafer to avoid differences between different wafers. The plasma-treated gate regions of devices treated with different fluorine plasma RF powers were separately opened by a step-and-repeat system. The properties of these devices are compared and analyzed. The devices with 150 W fluorine plasma treatment power and with 0.6 μm gate-length exhibited a threshold voltage of 0.57 V, a maximum drain current of 501 mA/mm, a maximum transconductance of 210 mS/mm, a current gain cutoff frequency of 19.4 GHz and a maximum oscillation frequency of 26 GHz. An excessive fluorine plasma treatment power of 250 W results in a small maximum drain current, which can be attributed to the implantation of fluorine plasma in the channel. 相似文献
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Depletion-mode and enhancement-mode AlGaN/GaN HEMTs using fluorine plasma treatment were integrated on one wafer.Direct-coupled FET logic circuits,such as an E/D HEMT inverter,NAND gate and D flip-flop,were fabricated on an AlGaN/GaN heterostructure.The D flip-flop and NAND gate are demonstrated in a GaN system for the first time.The dual-gate AlGaN/GaN E-HEMT substitutes two single-gate E-HEMTs for simplifying the NAND gate and shrinking the area,integrating with a conventional AlGaN/GaN D-HEMT and demonstrating a NAND gate.E/D-mode D flip-flop was fabricated by integrating the inverters and the NAND gate on the AlGaN/GaN heterostructure.At a supply voltage of 2 V,the E/D inverter shows an output logic swing of 1.7 V,a logic-low noise margin of 0.49 V and a logic-high noise margin of 0.83 V.The NAND gate and D flip-flop showed correct logic function demonstrating promising potential for GaN-based digital ICs. 相似文献
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正The fabrication of AlGaN/GaN double-channel high electron mobility transistors on sapphire substrates is reported.Two carrier channels are formed in an AlGaN/GaN/AlGaN/GaN multilayer structure.The DC performance of the resulting double-channel HEMT shows a wider high transconductance region compared with single-channel HEMT. Simulations provide an explanation for the influence of the double-channel on the high transconductance region.The buffer trap is suggested to be related to the wide region of high transconductance.The RF characteristics are also studied. 相似文献
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耗尽型和F等离子体处理增强型高电子迁移率晶体管(HEMT)被集成在同一圆片上。增强型/耗尽型 HEMT反向器、与非门以及D触发器等直接耦合场效应晶体管逻辑电路被制作在AlGaN/GaN异质结上。D触发器在GaN体系中首次被实现。在电源电压为2伏的条件下,增强型/耗尽型反向器显示输出逻辑摆幅为1.7伏,逻辑低噪声容限为0.49伏,逻辑高噪声容限为0.83伏。与非门和D触发器的功能正确,证实了GaN基数字电路的发展潜力。 相似文献
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