SiGeBiCMOS线性器件脉冲激光单粒子瞬态效应研究

验证SiGe BiCMOS工艺线性器件的单粒子瞬态（Single Event Transient,SET）效应敏感性,选取典型运算放大器THS4304和稳压器TPS760进行了脉冲激光试验研究。试验中,通过能量逐渐逼近方法确定了其诱发SET效应的激光阈值能量,并通过逐点扫描的办法分析了器件内部单粒子效应敏感区域,并在此基础上分析了脉冲激光能量与SET脉冲的相互关系,获得了单粒子效应截面,为SiGe BiCMOS工艺器件在卫星电子系统的筛选应用以及抗辐射加固设计提供数据参考。     

Effects of electron radiation on shielded space and triple-junction GaAs solar cells

The displacement damage dose methodology for analysing and modelling the performance of triple-junction InGaP₂/GaAs/Ge solar cells in an electron radiation environment is presented. Degradations at different electron energies are correlated with displacement damage dose (D_\rm d). One particular electron radiation environment, relative to a geosynchronous earth orbit (GEO), is chosen to calculate the total D_\rm d behind the different thicknesses coverglasses to predict the performance degradation at the end of the 15-year mission.     

Equivalent properties of single event burnout induced by different sources

The experimental results of single event burnout induced by heavy ions and 252Cf fission fragments in power MOSFET devices have been investigated. It is concluded that the characteristics of single event burnout induced by 252Cf fission fragments is consistent to that in heavy ions. The power MOSFET in the ＂turn-off＂ state is more susceptible to single event burnout than it is in the ＂turn-on＂ state. The thresholds of the drain-source voltage for single event burnout induced by 173 MeV bromine ions and ^252Cf fission fragments are close to each other, and the burnout cross section is sensitive to variation of the drain-source voltage above the threshold of single event burnout. In addition, the current waveforms of single event burnouts induced by different sources are similar. Different power MOSFET devices may have different probabilities for the occurrence of single event burnout.     

高速PWM单粒子瞬态效应脉冲激光模拟试验研究

利用脉冲激光验证高速脉宽调制控制器（Pulse Width Modulator,PWM）单粒子瞬态效应的敏感性和防护设计。试验中,通过改变脉冲激光能量,逐步扫描PWM控制器电路,确定了诱发单粒子瞬态效应的激光能量阈值和敏感区域。通过改变PWM控制器软启动配置电路设计,验证了防护电路设计的合理性,为卫星电源子系统的单粒子瞬态效应防护设计提供技术参考。     

基于肖特基电流输运模型和扫描分布电阻显微术的窄量子阱载流子浓度表征

目前对于纳米尺度半导体材料的局域电导与对应载流子浓度关系的描述主要以参数拟合为主。其关系模型主要依赖人工拟合参数, 例如理想因子。所以无法从测得局域电导分布来推出载流子浓度分布。为此, 提出了一种获取量子阱中载流子浓度的模型。通过小于10nm分辨的截面扫描分布电阻显微术, 测得了GaAs/AlGaAs量子阱 (110) 截面的局域电导分布。基于实验设置, 提出了只含有掺杂浓度参量的实验描述模型。通过模型, 由测得的量子阱 (掺杂浓度从1016/cm3到1018/cm3) 局域电导分布, 推导出了其载流子分布。相对误差在30%之内。     

Comparison study of the charge density distribution induced by heavy ions and pulsed lasers in silicon

Heavy ions and pulsed lasers are important means to simulate the ionization damage effects on semiconductor materials. The analytic solution of high-energy heavy ion energy loss in silicon has been obtained using the Bethe-Bloch formula and the Kobetich-Katz theory, and some ionization damage parameters of Fe ions in silicon, such as the track structure and ionized charge density distribution, have been calculated and analyzed according to the theoretical calculation results. Using the Gaussian function and Beer＇s law, the parameters of the track structure and charge density distribution induced by a pulsed laser in silicon have also been calculated and compared with those of Fe ions in silicon, which provides a theoretical basis for ionization damage effect modeling.     

脉冲激光模拟单粒子锁定试验研究

This paper introduces major characteristics of the single event latchup（SEL） in CMOS devices.We accomplish SEL tests for CPU and SRAM devices through the simulation by a pulse laser.The laser simulation results give the energy threshold for samples to undergo SEL.SEL current pulses are measured for CMOS devices in the latchup state,the sensitive areas in the devices are acquired,the major traits,causing large scale circuits to undergo SEL,are summarized,and the test equivalence between a pulse laser and ions is also analyzed.