Si基 ZnO纳米壁网格结构紫外探测器的制备

利用等离子体辅助分子束外延设备在Si（111）衬底上在没有任何催化剂情况下,得到了ZnO纳米壁的网状结构。这些ZnO纳米壁网格结构是c轴择优取向的。纳米结构的厚度为10到20纳米,高度大约为50纳米,这种纳米结构被制成平面的金属-半导体-金属结构的光导型紫外探测器件。这种探测器具有高响应,宽范围的特点。波长从360纳米减小到250纳米的过程中,器件的响应度无明显下降。在5V的偏压下,暗电流小于6μA。ZnO 纳米结构探测器响应峰值出现在360纳米处,其数值为15 A/W。探测器的紫外可见抑制比在2个量级以上。     

Fabrication of ZnO nanowall-network ultraviolet photodetector on Si substrates

ZnO nanowall networks were prepared by plasma-assisted molecular beam epitaxy without a catalyst on Si(111) substrates.The nanostructures have preferred orientation along the c axis.The nanostructures are about 10 to 20 nm thick and about 50 nm tall.The planar geometry photoconductive type metal-semiconductor-metal photodetector based on the ZnO nanowall networks exhibits a high and wide response spectrum,and no decrease from 250 to 360 nm.With the applied bias below 5 V,the dark current was below 6μA,and the peak responsivity of 15 A/W was achieved at 360 nm.The UV(360 nm) to visible(450 nm) rejection ratio of around two orders could be extracted from the spectra response.