（英）STI埋层的高光电流和低暗计数率单光子雪崩二极管

本文研究和分析了一种0.18-μm CMOS工艺单光子雪崩二极管（SPAD）,其结构能抑制过早的边缘击穿（PEB）,同时获得较大的光电流和低的暗计数率（DCR）。该SPAD由p-well/deep n-well的感光结,deep n-well向上扩散形成的区域和边缘Shallow Trench Isolation（STI）共同形成的保护环组成。通过测试确定了与光电流和暗率有关的STI层的大小。结果证明,在STI层与保护环之间的重叠区域为1-μm 时,SPAD的暗计数率和光电流最佳。此外,直径为10-μm的圆形SPAD器件的暗计数率为208Hz,且在波长为510nm时峰值光子探测概率为20.8%,此时具有低的暗计数率和高的探测效率以及宽的光谱响应特性。     

一种改进的CMOS紫外/蓝光光电二极管的二维响应度物理模型

A CMOS UV and blue-extended photodiode is presented and fabricated for light detection in the ultraviolet/blue spectral range. An octagon homocentric ring-shaped geometry is used to improve the ultraviolet responsivity and suppress edge breakdown. This paper has established a two-dimensional responsivity physical model for the presented photodiode and given some numerical analyses. The dead layer effect, which is caused by the high-doping effects and boron redistribution, is considered when analyzing the distribution of the current of the proposed UV and blue-extended photodiode. In the dead layer, the boron doping profile decreases towards the surface. Simulated results illustrate that the responsivity in the UV range is obviously decreased by the effect of the dead layer, while it is not affected in the visible and near-infrared part of the spectrum. The presented photodiode is fabricated and the silicon tested results are given, which agree well with the simulated ones.     

A novel composite UV/blue photodetector based on CMOS technology: design and simulation

A novel composite ultraviolet （UV）/blue photodetector is proposed in this paper. Lateral ring-shaped PN junction is used to separate photogenerated carriers and inject the non-equilibrium excess carriers to the bulk, changing the bulk potential and shifting the threshold voltage of the metal-oxide-semiconductor field-effect transistor （MOSFET） as well as the drain current. Numerical simulation is carried out, and the simulation results show that the composite photodetector has the enhanced responsivity for UV/blue spectrum. It exhibits very high sensitivity to weak and espe- cially ultra-weak light. A responsivity of 7000 A/W is obtained when the photodetector is illuminated under incident optical power of 0.01 μW. As a result, this proposed combined photodetector has great potential for UV/blue and ul- tra-weak light applications.     

高边缘击穿和扩展光谱的圆形单光子雪崩二极管

介绍了一种0. 18μm互补金属氧化物半导体(CMOS)技术的新型宽光谱荧光相关谱探测器,其为高边缘击穿、扩展光谱和低暗计数率的圆形单光子雪崩二极管(SPAD).该器件由p+/deep n-well结,p-well保护环和多晶硅保护环组成.通过Silvaco TCAD 3D器件仿真,直径为10μm的圆形p+/deep n-well SPAD器件具有较高边缘击穿特性.此外,p+/deep n-well结SPAD比p+/n-well结SPAD具有更长的波长响应和扩展光谱响应范围.该器件在0. 5 V过量偏压下,可在490～775 nm波长范围内实现超过40%的光子探测率.该圆形p+/deep n-well SPAD器件在25℃时具有较好雪崩击穿为15. 14 V,具有较低暗计数率为638 Hz.     

STI埋层的高光电流和低暗计数率单光子雪崩二极管（英文）

研究和分析了一种0. 18μm CMOS工艺单光子雪崩二极管(SPAD),其结构能抑制过早的边缘击穿(PEB),同时获得较大的光电流和低的暗计数率(DCR).该SPAD由p-well/deep n-well的感光结,deep n-well向上扩散形成的区域和边缘Shallow Trench Isolation(STI)共同形成的保护环组成.通过测试确定了与光电流和暗率有关的STI层的大小.结果证明,在STI层与保护环之间的重叠区域为1μm时,SPAD的暗计数率和光电流最佳.此外,直径为10μm的圆形SPAD器件的暗计数率为208 Hz,且在波长为510 nm时峰值光子探测概率为20. 8%,此时具有低的暗计数率和高的探测效率以及宽的光谱响应特性.