Response time improvement of AlGaN photoconductive detectors by adjusting crystal-nuclei coalescence process in metal organic vapor phase epitaxy

AlGaN photoconductive ultraviolet detectors are fabricated to study their time response characteristics. Persistent photoconductivity,a deterring factor for the detector response time,is found to be strongly related to the grain boundary density in AlGaN epilayers.By improving the crystal-nuclei coalescence process in metal organic vapor phase epitaxy,the grain-boundary density can be reduced,resulting in an-order-of-magnitude decrease in response time.     

Effects of SiNx on two-dimensional electron gas and current collapse of A1GaN/GaN high electron mobility transistors

SiNx is commonly used as a passivation material for AlGaN/GaN high electron mobility transistors (HEMTs). In this paper, the effects of SiN x passivation film on both two-dimensional electron gas characteristics and current collapse of AlGaN/GaN HEMTs are investigated. The SiNx films are deposited by high- and low-frequency plasma-enhanced chemical vapour deposition, and they display different strains on the AlGaN/GaN heterostructure, which can explain the experiment results.     

基于朗伯型反射微结构的LED室内照明光源设计

提出了一种基于朗伯型反射面的LED间接照明系统,即LED光源出射的光全部通过朗伯型反射面反射后再照射目标区域,该系统具有光源亮度均匀、灯具效率高等优点,很好地解决了高亮度LED点光源给室内照明带来的眩光问题。首先提出了一种能够很好逼近朗伯反射面的复合型微结构表面,并通过Lighttools光学仿真对其分布参数进行了优化,使最终结果在不同光线入射角的情况下,都具有较理想的余弦反射特性。在此基础上,设计了整体光学系统,使其实现了近180°范围的角度亮度的均匀性和高达84.7%的灯具效率,验证了间接照明方法的可行性。     

基于X射线衍射的GaN薄膜厚度的精确测量

结合Williamson-Hall plot方法和线型分析方法的优点,提出了一种有效分离有限晶粒尺寸和非均匀应力等X射线衍射展宽效应的方法,可以用于GaN外延层厚度等参数的快速精确测量.用该方法对一系列在蓝宝石衬底上生长的厚度在0.7—4.2μm的GaN外延膜进行了测量,并与椭圆偏振光谱法测量结果进行了比较,结果表明其差别<4%,反应了这种方法的准确性. 关键词： GaN薄膜 厚度测量 X射线衍射     

Effects of SiNx on two-dimensional electron gas and current collapse of AlGaN/GaN high electron mobility transistors

SiN_x is commonly used as a passivation material for AlGaN/GaN high electron mobility transistors (HEMTs). In this paper, the effects of SiN_x passivation film on both two-dimensional electron gas characteristics and current collapse of AlGaN/GaN HEMTs are investigated. The SiN_x films are deposited by high- and low-frequency plasma-enhanced chemical vapour deposition, and they display different strains on the AlGaN/GaN heterostructure, which can explain the experiment results.     

非故意掺杂GaN薄膜方块电阻与载气中N2比例关系研究

利用金属有机气相外延方法研究了非故意掺杂GaN薄膜的方块电阻与高温GaN体材料生长时载气中N₂比例的关系.研究发现,随着载气中N₂比例的增加,GaN薄膜方块电阻急剧增加.当载气中N₂比例为50%时,GaN薄膜方块电阻达1.1×10⁸Ω/□,且GaN表面平整,均方根粗糙度为0.233nm.二次离子质谱分析发现,载气中N₂比例不同的样品中碳、氧杂质含量无明显差别.随着载气中N₂比 关键词： 半绝缘GaN薄膜 载气 金属有机气相外延 位错     

GaN基三维结构生长与器件应用

目前,c面氮化镓(GaN)基发光二极管的制备技术已经十分成熟并取得了商业化成功,但仍面临极化电场导致的大电流密度下效率下降(Droop效应)和黄绿光波段效率低的问题。为消除极化电场的影响,人们开始关注半极性和非极性面GaN。其中,基于传统极性面衬底通过三维结构生长来获得半极性和非极性GaN的方法,由于其低成本和生长的灵活性,受到了广泛研究。本文首先总结了三种GaN三维结构的制备方法并分析其生长机理。接着,在此基础上介绍了不同晶面InGaN量子阱的外延生长和发光特性。最后,列举了GaN基三维结构在半极性面LED、颜色可调LED和无荧光粉白光发光二极管方面的应用。     

超宽带光电子芯片技术研究北大核心

超宽带光电子芯片是下一代无线通信、先进电子信息装备中光纤传输与信号处理的关键元器件,芯片中光子、电子、电磁场之间的相互作用是决定芯片性能的核心因素。文章通过介绍超宽带光电探测器芯片、电光调制器芯片等方面的研究进展,分享课题组在破解上述核心科学问题、提高芯片性能的关键技术方案。     

Improved Surface Characteristics and Contact Performance of Epitaxial p-AlGaN by a Chemical Treatment Process

The comparative study of epitaxial 380-run-thick p-Al0.091 Ga0.909 N materials without and with special surface chemical treatment is systematically carried out. After the treatment process, the deep level luminous peak in the 10 K photoluminescence spectrum is eliminated due to the decrease of surface nitrogen vacancy VN related defective sites, while the surface root-mean-square roughness in atomic force microscopy measurement is decreased from 0.395nm to 0.229nm by such a surface preparation method. Furthermore, the performance of surface contact with Ni/Au bilayer metal fihns is obviously improved with the reduction of the Schottky barrier height of 55meV. The x-ray photoelectron spectroscopy （XPS） results show a notable surface element content change after the treatment which is considered to be the cause of the above-mentioned surface characteristics improvement.     

分子束外延生长InGaN/AlN量子点的组分研究

报道了分子束外延生长的绿光波段InGaN/AlN量子点材料,并综合考虑InGaN量子点的应变弛豫,以及应力和量子限制斯塔克效应对量子点发光波长的影响,提出了一种结合反射式高能电子衍射原位测量与光致荧光测量确定InGaN量子点组分的方法.