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The unintentionally doped samples of Al0.22Ga0.78N/GaN/Al0.22Ga0.78N/GaN multi-heterostructures have been designed and fabricated. The polarization induced charge and free-carrier charge distributions have been demonstrated and the energy band profile has also been calculated. The results indicate the existence of two-dimensional 相似文献
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采用磁控溅射室温工艺制备了底栅结构ZnO基薄膜晶体管,其介电层表面采用低能Ar等离子体处理.结构表明等离子处理提高了器件的电学性能,即阈值下降36%,亚阈值斜率减少47%,开启电压从-15V变为0V.但是,经等离子处理的器件表现出源漏电流-栅电压(IDS-VG)迟滞和阈值频移现象.这说明Ar等离子体处理在提高器件电学性能的同时会降低器件的电学稳定性.我们基于溅射损伤和态密度变化规律解释了这种矛盾,并认为介电表面的离子损伤对ZnO基薄膜晶体管的电学稳定性会产生重要影响. 相似文献
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