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大分子螯合剂在低压力低磨料条件下铜膜的化学机械抛光中的应用 总被引:4,自引:4,他引:0
The mechanism of the FA/O chelating agent in the process of chemical mechanical polishing (CMP) is introduced. CMP is carried on a φ300 mm copper film. The higher polishing rate and lower surface roughness are acquired due to the action of an FA/O chelating agent with an extremely strong chelating ability under the condition of low pressure and low abrasive concentration during the CMP process. According to the results of several kinds of additive interaction curves when the pressure is 13.78 kPa, flow rate is 150 mL/min, and the rotating speed is 55/60 rpm, it can be demonstrated that the FA/O chelating agent plays important role during the CMP process. 相似文献
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基于改进的Newman和Ziff算法以及有限尺寸标度理论, 通过对表征渗流相变特征物理量的序参量、平均集团尺寸、二阶矩、标准偏差及尺寸不均匀性的数值模拟, 分析研究了Erdös Rényi随机网络上Achlioptas爆炸渗流模型的相变性质.研究表明: 尽管序参量表现出了不连续相变的特征, 但序参量以及其他特征物理量仍具有连续相变的幂律标度行为.因此严格地说, Erdös Rényi随机网络中的爆炸渗流相变是一种奇异相变, 它既不是标准的不连续相变, 又与常规随机渗流表现出的连续相变处于不同的普适类.
关键词:
Erdös Rényi随机网络
爆炸渗流模型
相变
幂律标度行为 相似文献
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We observed and analyzed the acid and HEBUT alkaline of Cu chemical mechanical polishing(CMP)slurry to evaluate their effects. Material analysis has shown that the planarity surfaces and the removal rate of alkaline slurry are better than the acid slurry during metal CMP processes. The global surface roughness and the small-scale surface roughness by 1010 m2 of copper film polished by the SVTC slurry are 1.127 nm and2.49 nm. However, it is found that the surface roughnesses of copper films polished by the HEBUT slurry are 0.728 nm and 0.215 nm. All other things being equal, the remaining step heights of copper films polished by the SVTC slurry and HEBUT slurry are respectively 150 nm and 50 nm. At the end of the polishing process, the dishing heights of the HEBUT slurry and the SVTC slurry are approximately both 30 nm, the erosion heights of the HEBUT slurry and the SVTC slurry are approximately both 20 nm. The surface states of the copper film after CMP are tested,and the AFM results of two samples are obviously seen. The surface polished by SVTC slurry shows many spikes.This indicates that the HEBUT alkaline slurry is promising for inter-level dielectric(ILD) applications in ultra large-scale integrated circuits(ULSI) technology. 相似文献
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地面数字电视覆盖网测试是广播电视监测监管的主要手段之一,地面数字电视覆盖网测试需要完成带内不平坦度测试、调制误差率测量、接收效果评价等指标测试。本文根据高原地区地面数字电视覆盖网测试经验,给出了由地面数字电视发射机测试和覆盖网测试所组成的实践测试方案。 相似文献
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随着广播电视事业的飞速发展,地面数字电视(DTMB)和移动多媒体广播(CMMB)等新业务的开展,VHF和UHF波段的广播电视业务的监测工作也有所增加,对接收链路提出了更高的要求.目前使用的接收链路存在两副天线接收信号频谱重叠现象、广播电视频段频谱扫描结果不理想等问题,对此本文提出更换接收天线和优化接收链路的监测前端设备接收改进方案. 相似文献
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通过低磨料浓度下催化反应对铜膜抛光速率的影响,证实了纳米SiO2胶体作为催化反应物可以极大地提高铜膜表面的化学反应速率。通过浸泡在不同磨料浓度抛光液中的铜电极表面腐蚀电位和腐蚀电流数值,进一步证实了催化反应能够加速凹处钝化膜的生成,并确定了在静态腐蚀条件下催化反应速率转换临界点所对应的纳米SiO2溶胶浓度为0.1vol%和1vol%。根据催化反应对铜晶圆各平坦化参数的影响,确定了低磨料CMP的最佳纳米SiO2溶胶浓度为0.3vol%,此时铜晶圆的抛光速率、台阶消除量、平坦化效率、碟形坑高度和腐蚀坑高度分别为535nm/min、299nm、56%、103nm和19nm。 相似文献
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基于三种MnFe基磁热材料的热容及等温磁熵变随温度变化的实验数据,本文应用热力学理论设计一种新型MnFe基复合磁热材料,获得三种组分磁热材料与复合材料的优化摩尔质量比,进一步以该复合磁热材料为工质构建回热式Ericsson和Brayton制冷循环,基于热力学分析和数值计算,比较这两种制冷循环的非平衡回热量、净制冷量及性能系数等重要热力学参量,同时将复合材料的相关结果与单组分磁热材料的加以对比,结果表明:复合材料的大磁熵变温区要比任何一种组分材料的宽得多,而以复合材料为工质的制冷循环的净制冷量在近15 K温区内都较大,所得结果能为室温磁制冷机的参数优化设计提供有益的参考。 相似文献
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