InAs/GaAs submonolayer quantum-dot superluminescent diodes with active multimode interferometer configuration

With a chirped InAs/GaAs SML-QD (quantum dot) structure serving as the active region, the superluminescent diodes emitting at wavelength of around 970nm are fabricated. By using an active multimode interferometer configuration, these devices exhibit high continue-wave output powers from the narrow ridge waveguides. At continue-wave injection current of 800mA, an output power of 18.5mW, and the single Gaussian-like emission spectrum centered at 972nm with a full width at half maximum of 18nm are obtained.     

安徽卫视春晚虚拟技术应用解析

以《金猴报春,福满江淮》为主题的2016安徽卫视春节联欢晚会为例,具体介绍安徽卫视是如何采用ORAD的ReatSet虚拟植入系统,将计算机制作的三维虚拟模型、视频和三维动画整合到舞台实景中或者将外景拍摄中的任何地方,保持实景与三维虚拟场景同步变化,以获得虚实结合的完美画面.     

大功率短波长InAlGaAs/AlGaAs量子点超辐射发光管

为了满足超辐射发光管的短波长应用,采用InAlGaAs/AlGaAs量子点有源区和干法刻蚀工艺制备了短波长弯曲波导超辐射发光管。在1.6A脉冲电流注入下,器件峰值输出功率为29mW,中心波长为880nm,光谱半高宽为20.3nm。比较了干法刻蚀工艺和湿法腐蚀工艺对超辐射发光管器件性能的影响。在1.6A脉冲电流注入下,湿法腐蚀制备的器件峰值输出功率仅为7mW。与湿法腐蚀相比,干法刻蚀可以精确控制波导形状和参数,降低波导损耗,有效增大器件输出功率。     

ZnO薄膜器件欧姆电极的高掺杂接触法制备

利用脉冲激光沉积方法在Al/Si衬底上生长出了高质量的n型ZnO单晶薄膜。研究并总结了以金属Al材料制备ZnO薄膜器件欧姆电极的方法。选择功函数合适的金属作为电极材料,比如In、Ti和Al等,可以在n型ZnO薄膜上制作良好的欧姆电极。研究发现,在金属Al和n型ZnO膜之间生长一层高掺杂的AZO层,可得到比Al与n型ZnO直接接触更优良的欧姆性能。并且,通过高温退火可以有效提高金属Al电极的结晶质量和电导率,降低电极与n型ZnO界面处的接触势垒,从而实现优良的欧姆接触性能。     

Electrical properties of silver Schottky contacts to ZnO thin films

ZnO thin films are deposited on Al/Si substrates by the pulsed laser deposition （PLD） method. The XRD and SEM images of films are examined. Highly c-axis oriented ZnO thin films which have uniform compact surface morphology are fabricated. The size of surface grains is about 30 nm. The Schottky barrier ultraviolet detectors with silver Schottky contacts are made on ZnO thin films. The current-voltage characteristics are measured. The ideality contact factor between Ag and ZnO film is 1.22, while the barrier height is 0.908 e V. After annealing at 600 ℃ for 2h, the ideality factor is 1.18 and the barrier height is 0.988 eV. With the illumination of 325 nm wavelength UV-light, the photocurrent-to-dark current ratios before and after annealing are 140.4 and 138.4 biased at 5 V, respectively. The photocurrents increase more than two orders of magnitude over the dark currents.     

光电探测器结构对光响应特性的影响

为了研究不同结构光电探测器的光响应特性,采用脉冲激光沉积技术在玻璃衬底上制备了ZnO基紫外探测器。X射线衍射谱、扫描电子显微镜和光致发光光谱显示,ZnO膜为多晶结构,表面平整,并具有良好的化学配比。比较平面结构探测器和夹层式探测器的光响应特性可知,探测器结构对光电探测特性具有重要影响。结果表明,平面结构探测器中的电极宽度引起响应时间和响应度之间的竞争,而具有透明电极氧化铟锡的夹层式探测器则不存在这一问题。     

Short-wavelength InAlGaAs/AlGaAs quantum dot superluminescent diodes

This paper reports the fabrication of J-shaped bent-waveguide superluminescent diodes utilizing an InAlGaAs/AlGaAs quantum dot active region. The emission spectrum of the device is centred at 884 nm with a full width at half maximum of 37 nm and an output power of 18 mW. By incorporating an Al composition into the quantum dot active region, short-wavelength superluminescent diode devices can be obtained. An intersection was found for the light power-injection current curves measured from the straight-waveguide facet and the bent-waveguide facet, respectively. The result is attributed to the conjunct effects of the gain and the additional loss of the bent waveguide. A numerical simulation is performed to verify the qualitative explanation. It is shown that bent waveguide loss is an important factor that affects the output power of J-shaped superluminescent diode devices.     

氦压对类金刚石薄膜结构和光学性质的影响

使用脉冲激光沉积技术在不同氦压下制备了系列无氢类金刚石薄膜,测量了样品的Raman光谱、光吸收光谱和光致发光光谱,采用原子力显微镜测试了薄膜的表面形貌,研究了薄膜的微结构和光学性质与制备条件的依赖关系. 结果表明,该薄膜是由sp2和sp3杂化碳原子组成的非晶碳膜. 薄膜的光学带隙在1.45～1.78 eV. 薄膜的发光在可见光区呈宽带结构,氦压能够对类金刚石薄膜的结构和光学性质产生较大影响. 当氦压从0.05 Pa升高至15 Pa时,sp2团簇变大,带尾态增多,从而导致薄膜的发光增强,光学带隙变窄,发光峰位红移. AFM 形貌表明随着氦压的升高,薄膜的表面由致密光滑变得粗糙,并且许多大小不均匀的球状颗粒出现在薄膜表面.     

原子气室中碱金属含量的测量方法

原子气室作为新型量子惯性仪表的核心部件，其中填充的碱金属量直接决定了惯性仪表设备的寿命，准确测量气室内的碱金属对后续碱金属填充等气室制备工艺的优化至关重要。重点研究了气室内碱金属分布以及升温速率对碱金属含量测试结果的影响，发现碱金属集中分布有利于碱金属量的准确测量，当碱金属分布直径足够小时，碱金属量测量值趋于稳定，而测量过程升温速率对测试结果影响较小。通过优化，实现了碱金属铷含量的测量精度优于7%。     

Cu掺杂ZnO薄膜光学性质的研究

为了制备结晶质量好的Cu掺杂ZnO薄膜,研究其结构和光学性质,采用脉冲激光沉积方法,在Si衬底上选择不同的衬底温度来制备薄膜。实验成功制得了结晶质量较好的Cu掺杂ZnO薄膜。利用X射线衍射仪、扫描电子显微镜和荧光分光光度计对样品进行了测量和分析。所制备的样品均表现出高度的c轴择优取向,衬底温度为300℃时,薄膜表面形貌均匀致密;在样品的光致发光谱中,发现样品除了在380nm附近出现紫外发光峰外,在460nm附近出现了蓝光发光峰,真正意义上实现了ZnO薄膜的蓝光发射。结果表明,衬底温度对其晶体质量有较大影响。