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为了说明原子光刻(Atom Lithography)在纳米计量及传递作用中的特殊地位,首先对纳米计量标准及其现状进行了简要介绍,提出纳米计量中原子光刻的基本概念和优势,结合原子光刻实验装置对原子光刻技术的工作机理进行了分析。结果表明,可以通过原子光刻技术得到纳米量级刻印条纹,为纳米计量及标准传递提供更加精确的手段。最后对常见的2种原子光刻技术——沉积型原子光刻和虚狭缝型原子光刻进行了阐述,指出2者的不同之处,为不同条件下原子光刻提供了一定的借鉴。 相似文献
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通过分析52Cr原子光刻对激光系统的技术要求,详细介绍了一种基于原子束激光感生荧光(LIF)光 谱技术的稳频方法。 相似文献
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本文介绍了一种NLiNbO3电光晶件作调制器,高稳定性硅光电二级管作监测器并有高质量光反馈电子元件的高稳定度激光功率稳定仪。只要输出功率大于1mW、稳定度优于5%/小时,使用本稳功率性后,功率稳定度可忧于0.05%小时。激光功率稳定范围在三个量稳内可调。 相似文献
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利用原子光刻的方法制备纳米结构的光栅已经成为了一种较为成熟的工艺。通过原子与激光驻波场的相互作用,利用原子自生在势能场中的偶极力对原子的密度进行调制,从而得到所需要的光栅结构。利用此种工艺所制备的光栅相对于传统工艺来说具有精度高,光栅常数直接溯源于原子能级。希望能够通过对激光的改良来提升原子沉积结果。通过双层驻波场来提高原子沉积质量已经被多次提到。实验中利用几何光学的方法实现了所需要的新型激光驻波场。并对其汇聚,相干等特性进行了研究,取得了较为满意的结果。为利用双层驻波场来沉积原子打下了基础。 相似文献
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计算电容是复现电学阻抗单位的基准装置, 利用计算电容值和量子霍尔电阻值可以准确计算出精细结构常数α. 计算电容的本质是通过高准确度地测量屏蔽电极的位移, 实现对电容量值的测量. 因此, 基于Fabry-Perot干涉仪的精密电极位移测量系统是计算电容装置中最为核心和关键的部分. 在Fabry-Perot干涉仪测位移过程中, 由于高斯激光束存在轴向Gouy相位, 该附加相位将会引起相邻干涉条纹对应位移的变化(大于或者小于λ/2), 导致位移的测量值与实际值存在偏差. 本文阐述了高斯激光场的传播特性, 利用高斯激光束在自由空间和透过薄透镜复振幅的变换关系, 建立了计算电容装置中Fabry-Perot干涉仪透射光束的传输模型; 通过对不同腔长的Fabry-Perot干涉仪透射光场相位的分析, 获得了高斯激光束轴向Gouy相位修正与传输距离的关系. 结果表明, 当腔长从111.3 mm移动至316.3 mm时, 在接收距离为560 mm的情况下, 高斯光束轴向Gouy 相位引起的位移修正的绝对值最小为0.7 nm, 其相对相位修正量|δL|/|ΔL| = 3.4×10-9. 相似文献
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Analysis of Cr atom focusing deposition properties in the double half Gaussian standing wave field 下载免费PDF全文
The use of the dipole force on atoms is a new technology that is used to build nanostructures. In this way, a high quality standard nano-grating can be obtained. Based on the semi-classical model, the motion equation is investigated and the trajectories of atoms in double half Gaussian standing wave field are simulated. Compared with the Gaussian standing wave field, the double half Gaussian standing wave can well focus the Cr atoms. In order to obtain this kind of beam, a prism is designed and the experimental result shows that the beam is well generated. 相似文献
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Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography 总被引:1,自引:0,他引:1 下载免费PDF全文
Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions.The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of the chromium atom.The collimation ratio is 0.45 vertically(in x axis),and it is 0.55 horizontally(in y axis).The theoretical model is also simulated,and success of our structured mirror array is achieved. 相似文献
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This paper presents the experimental progress of laser-focused Cr atomic deposition and the experimental condition.The result is an accurate array of lines with a periodicity of 212.8±0.2 nm and mean full-width at half maximum as approximately 95 nm.Surface growth in laser-focused Cr atomic deposition is modeled and studied by kinetic Monte Carlo simulation including two events:the one is that atom trajectories in laser standing wave are simulated with the semiclassical equations of motion to obtain the deposition position;the other is that adatom diffuses by considering two major diffusion processes,namely,terrace diffusion and step-edge descending.Comparing with experimental results(Anderson W R,Bradley C C,McClelland J J and Celotta R J 1999 Phys.Rev.A 59 2476),it finds that the simulated trend of dependence on feature width is in agreement with the power of standing wave,the other two simulated trends are the same in the initial stage.These results demonstrate that some surface diffusion processes play important role in feature width broadening.Numerical result also shows that high incoming beam flux of atoms deposited redounds to decrease the distance between adatoms which can diffuse to minimize the feature width and enhance the contrast. 相似文献
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