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We report on the lasing characteristics of a two-color InAs/InP quantum dots(QDs)laser at a low tem-perature.Two lasing peaks with a tunable gap are simultaneously observed.At a low temperature of 80 K,a tunable range greater than a 20-nm wavelength is demonstrated by varying the injection current from 30 to 500 mA.Under a special condition,we even observe three lasing peaks,which are in contrast to those observed at room temperature.The temperature coefficient of the lasing wavelength was obtained for the two colors in the 80?280 K temperature range,which is lower than that of the reference quantum well(QW)laser working in the same wavelength region. 相似文献
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解决了一类带阻尼项的三阶脉冲微分方程的非振动解与其一阶、二阶导数的符号关系,用迭代法得到其振动性与渐近性的判别准则,并举例说明准则的有效性. 相似文献
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近年来半导体材料主要朝两个方向发展:一方面是材料工程,即通过不断探索扩展新的半导体材料实现;另一方面是能带工程,即通过改变已知材料的维度进而实现能带的调节。准零维半导体量子点就是通过改变其尺寸调控能带的典型代表。主要论述了准零维量子点激光器发展过程中遇到的一些瓶颈问题。 相似文献
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We investigate InAs/GaAs quantum dot(QD) lasers grown by gas source molecular beam epitaxy with different growth temperatures for InAs dot layers.The same laser structures are grown,but the growth temperatures of InAs dot layers are set as 425 and 500 ℃,respectively.Ridge waveguide laser diodes are fabricated,and the characteristics of the QD lasers are systematically studied.The laser diodes with QDs grown at 425℃ show better performance,such as threshold current density,output power,internal quantum efficiency,and characteristic temperature,than those with QDs grown at 500 C.This finding is ascribed to the higher QD density and more uniform size distribution of QDs achieved at 425℃. 相似文献
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由于与硅集成电路工艺兼容的张应变锗薄膜在光电器件如光电探测器、调制器,特别是发光器件中具有潜在的应用前景,使其得到了广泛关注.然而,在锗薄膜中引入可控的、大的张应变是个挑战.综述了张应变锗薄膜制备技术的研究进展,重点介绍了在锗薄膜中引入张应变的外延技术、应变转移技术、应变浓缩技术和机械应变技术的工艺流程和实验结果,并讨论了它们的优点和缺点.采用应变浓缩技术制备的厚度为350 nm的锗薄膜微桥的单轴张应变和微盘的双轴张应变分别达到了4.9%和1.9%,可将锗调制为直接带隙材料,适用于锗激光器的研制. 相似文献