(CoFe)Se2@NC超级电容器电极材料的制备及其电化学性能

金属-有机框架(MOF)衍生的过渡金属硒化物和多孔碳纳米复合材料具有巨大的储能优势,是应用于电化学储能的优良电极材料。采用共沉淀法制备CoFe类普鲁士蓝(CoFe-PBA)纳米立方,并通过静电组装在CoFe-PBA上包覆聚吡咯(PPy)得到CoFe-PBA@PPy;通过在400℃氮气中退火并硒化成功制备了氮掺杂的碳(NC)包覆(CoFe)Se₂的(CoFe)Se₂@NC纳米复合材料,并对其结构和形貌进行了表征。以(CoFe)Se₂@NC为电极制备了超级电容器,测试了其电化学性能,结果表明,在电流密度1 A/g时超级电容器的比电容达到1047.9 F/g,在电流密度5 A/g下1000次循环后具有良好的循环稳定性和96.55%的比电容保持率。由于其性能优越、无毒、成本低和易于制备,未来(CoFe)Se₂@NC纳米复合材料在超级电容器中具有非常大的应用潜力。     

Tm2O3相对于Si的能带偏移研究

利用分子束外延系统在Si (001) 衬底上制备了单晶Tm₂O₃薄膜, 利用X射线光电子能谱研究了Tm₂O₃相对于Si的能带偏移. 得出Tm₂O₃相对于Si的价带和导带偏移分别为3.1 eV± 0.2 eV和1.9 eV± 0.3 eV, 并得出了Tm₂O₃的禁带宽度为6.1 eV± 0.2 eV. 研究结果表明Tm₂O₃是一种很有前途的高k栅介质候选材料. 关键词： 2O₃')" href="#">Tm₂O₃ X射线光电子能谱 能带偏移     

Er2O3单晶薄膜的生长及Er2O3/Si异质结的能带偏移

利用分子束外延方法在p型Si(001)和Si (111)衬底上，在700℃ 0.93mPa的条件下实现了Er2O3单晶薄膜的生长.薄膜的结晶情况依赖于薄膜的生长温度和氧气压.较低的温度和氧气压下在薄膜内易生成硅化铒，薄膜也趋于多晶化.还利用光电子能谱对Er2O3/Si异质结的能带偏差进行了初步的研究.     

Si基Er2O3薄膜初始生长的原位RHEED和AES研究

采用分子束外延(MBE)法在Si(001)衬底上生长Er2O3高k薄膜材料。X射线衍射结果表明,用这一方法得到的硅基Er2O3薄膜是(440)取向的单晶,电学测试预示在Si和Er2O3薄膜的界面有一层很薄的界面层。为了研究Si/Er2O3异质结的界面,通过原位反射式高能电子衍射(RHEED)和俄歇能谱(AES)的方法对Er2O3薄膜在Si衬底上的初始生长情况进行研究。发现在清洁的Si衬底和有SiO2的Si衬底上生长Er2O3薄膜,原位RHEED图谱和AES都有不同的结果,预示着这两种不同的衬底上生长Er2O3薄膜的初始阶段有不同的化学反应。这一现象可能阐释了界面的演变和控制机理。     

低温磁控溅射制备CdS薄膜的结构和光学特性

用磁控溅射的方法在透明导电氧化物衬底上制备了CdS薄膜,制备时的衬底温度为30~200℃.X射线衍射测试结果表明在这一条件下制备的CdS薄膜是六角纤锌矿的多晶结构.扫描电子显微镜结果显示薄膜具有较好的晶体质量,这一结论也和拉曼光谱、紫外-可见吸收光谱、光致发光光谱的结果一致.拉曼光谱显示CdS薄膜内部的压应力随着制备温度的提高而增大.     

Current mechanism and band alignment of Al(Pt)/HfGdO/Ge capacitors

HfGdO high-k gate dielectric thin films were deposited on Ge substrates by radio-frequency magnetron sputtering. The current transport properties of Al(Pt)/HfGdO/Ge MOS structures were investigated at room temperature. The results show that the leakage currents are mainly induced by Frenkel-Poole emissions at a low electric field. At a high electric field, Fowler Nordheim tunneling dominates the current. The energy barriers were obtained by analyzing the Fowler Nordheim tunneling characteristics, which are 1.62 eV and 2.77 eV for Al/HfGdO and Pt/HfGdO, respectively. The energy band alignments for metal/HfGdO/Ge capacitors are summarized together with the results of current-voltage and the x-ray photoelectron spectroscopy.     

超级电容器电极材料VS4@PPy的制备及其电化学性能

探索具有优异电化学性能的电极材料是推进超级电容器发展的关键,设计优化过渡金属硫化物并研究其电化学性能对超级电容器的发展和应用至关重要.具有多种不同形貌的VS4正是研究重点之一.采用简单的一步水热法制备了花状VS4纳米材料,通过原位氧化聚合法在VS4上包覆聚吡咯(PPy),得到VS4@PPy纳米复合材料.PPy出色的导电...     

Amorphous Er2O3 films for antireflection coatings

This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400-1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.     

CdS薄膜的制备、结构和光致发光性能

CdS薄膜是一种n型半导体材料,用于CdTe多晶薄膜太阳电池的窗口层,其质量直接影响太阳电池的光电转换效率和寿命。用磁控溅射法制备了CdS薄膜,通过对薄膜进行X射线衍射(XRD)、扫描电子显微镜(SEM)、光致发光和紫外-可见光谱等测试,研究了CdS薄膜的制备工艺对薄膜结晶度、表面形貌和禁带宽度的影响关系。研究发现,随着CdS薄膜溅射功率的升高,薄膜的结晶度变好,晶粒增大,薄膜增厚,光致发光峰强度增加,禁带宽度减小;随着溅射气压减小,薄膜厚度增大,光致发光峰强度减小,禁带宽度减小。     

Band Alignment and Band Gap Characterization of La2O3 Films on Si Substrates Grown by Radio Frequency Magnetron Sputtering

La2O3 films are grown on Si （100） substrates by the radio-frequency magnetron sputtering technique. The band alignment of the La203/Si heterojunction is analyzed by the x-ray photoelectron spectroscopy. The valence- band and the conduction-band offsets of La2 Oa films to Si substrates are found to be 2.40±0.1 and 1.66±0.3 eV, respectively. Based on 0 ls energy loss spectrum analysis, it can be noted that the energy gap of La203 films is 5.18±0.2eV, which is confirmed by the ultra-violet visible spectrum. According to the suitable band offset and large band gap, it can be concluded that La2O3 could be a promising candidate to act as high-k gate dielectrics.