纳米电子器件及其集成

对基于Top-Down加工技术的纳米电子器件如：单电子器件、共振器件、分子电子器件等的研究现状、面临的主要挑战等进行了讨论. 采用CMOS兼容的工艺成功地研制出单电子器件，观察到明显的库仑阻塞效应；在半绝缘GaAs衬底上制作了AlAs/GaAs/In0.1Ga0.9As/GaAs/AlAs双势垒共振隧穿二极管,采用环型集电极和薄势垒结构研制的共振隧穿器件，在室温下测得其峰谷电流比高达13.98，峰电流密度大于89kA/cm2；概述了交叉阵列的分子存储器的研究进展.     

单次可编程金属-分子-金属器件

提出了一种单次可编程的金属-分子-金属器件. 该器件利用一种经过改良的Rotaxane LB膜作为功能层,可以和应用于场编程门阵列电路中的无机反熔丝器件相比拟,将在有机可编程电路和容错电路等方面有较广泛的应用. 所有的加工工艺都是低温工艺,使得该器件可以和其他有机器件集成. 电学测试表明该器件有良好的单次编程能力,其击穿电压为2.2V,关态电阻为15kΩ,而开态电阻为54Ω. 据分析,这一特性是由非对称的电极结构和金属原子在高电场作用下穿透了分子薄膜所造成的.     

Study of top and bottom contact resistance in one organic field-effect transistor

This paper reports that the organic field-effect transistors with hybrid contact geometry were fabricated, in which the top electrodes and the bottom electrodes were combined in parallel resistances within one transistor. With the facility of the novel structure, the difference of contact resistance between the top contact geometry and the bottom contact geometry was studied. The hybrid contact devices showed similar characteristics with the top contact configuration devices, which provide helpful evidence on the lower contact resistance of the top contact configuration device. The origin of the different contact resistance between the top contact device and the bottom contact device was discussed.     

有机半导体薄膜层的图形化方法

对有机半导体层的图形化方法进行了详细介绍.对比分析了非传统有机半导体薄层的图形化方法和与传统光刻技术类似的有机层图形化方法,指出了各种方法的适用范围及其优缺点.     

γ radiation caused graphene defects and increased carrier density

We report on a micro-Raman investigation of inducing defects in mono-layer, bi-layer and tri-layer graphene by γ ray radiation. It is found that the radiation exposure results in two-dimensional (2D) and G band position evolution with the layer number increasing and D and D' bands rising, suggesting the presence of defects and related crystal lattice deformation in graphene. Bi-layer graphene is more stable than mono- and tri-layer graphene, indicating that the former is a better candidate in the application of radiation environments. Also, the DC electrical property of the mono-layer graphene device shows that the defects increase the carrier density.     

基于共沉积技术的AgTCNQ的有机双稳态器件

采用共沉积技术制备了AgTCNQ薄膜,并进行了红外、紫外光谱表征.利用微电子工艺制备了基于AgTCNQ薄膜的有机双稳态器件.研究发现,Ti/AgTCNQ/Au双稳态器件具有可逆、可重复的开关存储特性.将器件从初始的高阻态转变为低阻态的正向开关阈值电压为3.8～5V,将低阻态转变为高阻态的负向阈值电压仅为-3.5～-4.4V,与通常的CuTCNQ器件相比较小.这种基于AgTCNQ交叉结构的有机双稳态器件可应用于非易失性有机存储器.     

单次可编程金属-分子-金属器件

提出了一种单次可编程的金属-分子-金属器件.该器件利用一种经过改良的Rotaxane LB膜作为功能层.可以和应用于场编程门阵列电路中的无机反熔丝器件相比拟,将在有机可编程电路和容错电路等方面有较广泛的应用.所有的加工工艺都是低温工艺,使得该器件可以和其他有机器件集成.电学测试表明该器件有良好的单次编程能力,其击穿电压为2.2V,关态电阻为15kΩ,而开态电阻为54Ω.据分析,这一特性是由非对称的电极结构和金属原子在高电场作用下穿透了分子薄膜所造成的.     

纳米电子器件及其集成

对基于Top-Down加工技术的纳米电子器件如:单电子器件、共振器件、分子电子器件等的研究现状、面临的主要挑战等进行了讨论.采用CMOS兼容的工艺成功地研制出单电子器件,观察到明显的库仑阻塞效应;在半绝缘GaAs衬底上制作了AlAs/GaAs/In0.1 Ga0.9As/GaAs/AlAs双势垒共振隧穿二极管,采用环型集电极和薄势垒结构研制的共振隧穿器件,在室温下测得其峰谷电流比高达13.98,峰电流密度大于89kA/cm2;概述了交叉阵列的分子存储器的研究进展.     

Analytical model for the dispersion of sub-threshold current in organic thin-film transistors

This paper proposes an equivalent circuit model to analyze the reason for the dispersion of sub-threshold current(also known as zero-current point dispersion) in organic thin-film transistors.Based on the level 61 amorphous silicon thin-film transistor model in star-HSPICE,the results from our equivalent circuit model simulation reveal that zero-current point dispersion can be attributed to two factors:large contact resistance and small gate resistance.Furthermore,it is found that decreasing the contact resistance and increasing the gate resistance can efficiently reduce the dispersion.If the contact resistance can be controlled to 0Ω,all the zero-current points can gather together at the base point.A large gate resistance is good for constraining the dispersion of the zero-current points and gate leakage.The variances of the zero-current points are 0.0057 and nearly 0 when the gate resistances are 17 MΩand 276 MΩ,respectively.     

基于共沉积技术的AgTCNQ的有机双稳态器件

采用共沉积技术制备了AgTCNQ薄膜,并进行了红外、紫外光谱表征.利用微电子工艺制备了基于AgTCNQ薄膜的有机双稳态器件.研究发现,Ti/AgTCNQ/Au双稳态器件具有可逆、可重复的开关存储特性.将器件从初始的高阻态转变为低阻态的正向开关阈值电压为3.8～5V,将低阻态转变为高阻态的负向阈值电压仅为-3.5～-4.4V,与通常的CuTCNQ器件相比较小.这种基于AgTCNQ交叉结构的有机双稳态器件可应用于非易失性有机存储器.