Accumulation of hydrogen by silicon powders in HF inductive discharge plasma

The possibility of saturation with hydrogen of micro- and nanostructured silicon powders in electrodeless plasma is demonstrated. It is established that the hydrogen concentration in the bulk of the powder is determined by the size of its particles, the hydrogen pressure in the reaction chamber, and the HF power. The mechanism of plasma saturation with hydrogen is based on the chemical interaction of hydrogen atoms and active radicals with the surface of particles of the silicon powder, which is a surface with a distorted order of stacking of silicon atoms.     

Optical and Electrophysical Properties of Thin Zinc Oxide Films Doped with Manganese Oxide and Obtained by Laser Deposition

Journal of Applied Spectroscopy - Nanostructured thin films on a silicon substrate were obtained on a ceramic of zinc oxide doped with manganese oxide by high-frequency periodic pulsed laser action...