Non-monotonous dependence of surface roughness on factors influencing energy of adatoms during thin island film growth

Many experimental results show that surface roughness of thin films can increase, decrease, stay constant or pass through the minimum with the change in substrate temperature, energy of arriving atoms or assisted beam (electrons, photons, ions), depending on material and interval of variation of those parameters. The aim of this paper is to explain and analyze this non-monotonous behavior of surface roughness by proposed kinetic model. The model is based on rate equations and includes processes of surface diffusion of adatoms, nucleation, growth and coalescence of islands in the case of thin films growth in Volmer-Weber mode. It is shown by modeling that non-monotonous dependence of surface roughness on the factors influencing energy of adatoms (e.g. temperature, assisted beam irradiation, accelerating voltage) occurs as a result of interplay between diffusion length of adatoms and size of islands, because both parameters depend on energy of adatoms. Variation of island size and diffusion length results in atomic jumps from islands forming rougher or smoother surface. The functions of surface roughness, island size, island density on diffusion length of adatoms and on other parameters are calculated and analyzed in this work.     

Formation of gold-capped silicon nanocolumns on silicon substrate

Gold-capped silicon nanocolumns regularly distributed over silicon substrate were obtained. The columns length was roughly 100 nm; their deviation from perpendicular axis was less than 2°. The diameter of the columns was of the order of 10 nm or below of that. The proposed procedure of nanostructuring included the following main steps: deposition of aluminum thin layer (100–500 nm) by magnetron sputtering on (100) oriented Si wafers; formation of porous self-ordered alumina structures by electrochemical anodizing of the Al film in oxalic acid; electroless inversion of Au in alumina pores; and reactive ion etching. The obtained Si–Au structures are of importance as the platforms for biosensing applications, while the gold-free structures are of interest in photovoltaics.

     

Study of nanoclusters growth at initial stages of ultrathin film deposition by kinetic modeling

Comparative analysis of Au, Cu, Pt, Ni and Fe nanoclusters growth on amorphous carbon substrate by proposed kinetic model based on rate equations is present. Partial sticking coefficients introduced into the model let to discriminate elementary processes such as adatom adsorption and diffusion on bare substrate and on top of islands, nucleation and mobility of islands and its coalescence, 2-d and 3-d island growth modes. The quantitative fittings of experimental time dependencies of surface coverage, clusters density, cluster size are performed by solving model equations. From the best fittings the values of phenomenological coefficients defining elementary processes are found for different materials. Comparative analysis of those coefficients let to discover mechanisms of nanoclusters formation and growth of different materials. It is shown that clusterization for Cu and Au is more favorable than for Pt and Ni. Diffusivity for Pt and Ni on amorphous carbon (a-C) substrate is significantly less than for Au and Cu. In opposite, diffusivity on the top of islands for Ni and Pt is significantly higher than for Au and Cu. The mobility of islands for Au and Cu is much higher than for Ni and Pt. The fitting of experimental curves of Fe deposition on a-C at different temperatures showed that temperature mainly influences sticking process but not diffusion.     

A strategy for a national metrology institute to create a cost effective distributed metrology infrastructure for chemical measurements

A sound strategy for a national metrology institute (NMI) is proposed, describing how to set up an metrology infrastructure for chemical measurements. A national measurement infrastructure is defined as a collection of various measurement services (testing, calibration and reference laboratories) and the communication between these services. For clarity, in this paper the distributed metrology infrastructure covers those organisations that are involved in disseminating measurement traceability (i.e. the national metrology institute and the reference laboratories acting as national reference standard holders).The strategy aims at a proper support of sectoral field laboratories. It is based on a distributed metrology system. Such a system is composed of clearly identified national reference standard holders for particular measurement services (e.g. for a particular analyte in a particular matrix) co-ordinated via an NMI. Such national reference standard holders, appointed by the NMI, represent the best measurement capability inside the country, and their appointment is based on demonstrated measurement competence. They receive support (e.g. under contract) from the NMI to fulfil this role. They have the obligation to demonstrate their measurement capabilities on a regular basis and in a publicly open and transparent way.In particular and carefully selected cases, the NMI itself can and should act as national reference standard holder. The NMI should particularly devote a large part of its resources to cross-sectoral knowledge transfer, to advice and co-ordination. This can be achieved by participating in teaching/training, by supporting the accreditation, by being involved in advising governmental bodies in authorisation of laboratories and by assisting in the implementation of legislation.As a consequence, only when values produced at the NMI (or one of its designated national reference standard holders) are disseminated to field laboratories (e.g. for CRMs or as a calibration service) will it be necessary to have the NMI measurement capability recognised under the CIPM-MRA system.Such a distributed system requires an efficient communication tool between the three stakeholders concerned: the NMI, the national reference standard holder and the end users. The latter not only include the field laboratories, but also governmental bodies and the national accreditation body.Presented at the XVIIIth IMEKO Congress in Dubrovnik-Cavtat, June 22–27, 2003Further contributors to this paper: M. Buzoianu (National Institute of Metrology, Bucharest), W.Kozlowski (Central Office of Measures, Warsaw), P. Klenovsky, Frantisek Jelinek (CMI, Prague), C. Michael (State General Laboratory, Nicosia), Zsofia Nagyné Szilágyi, (National Office of Measures, Budapest), V. Patoprsty (Slovak Institute of Metrology, Bratislava), A. Todorova (SAMTS Sofia)     

Formation of gold-capped silicon nanocolumns on silicon substrate

Gold-capped silicon nanocolumns regularly distributed over silicon substrate were obtained. The columns length was roughly 100?nm; their deviation from perpendicular axis was less than 2°. The diameter of the columns was of the order of 10?nm or below of that. The proposed procedure of nanostructuring included the following main steps: deposition of aluminum thin layer (100?C500?nm) by magnetron sputtering on (100) oriented Si wafers; formation of porous self-ordered alumina structures by electrochemical anodizing of the Al film in oxalic acid; electroless inversion of Au in alumina pores; and reactive ion etching. The obtained Si?CAu structures are of importance as the platforms for biosensing applications, while the gold-free structures are of interest in photovoltaics.