Multilayer optics for XUV spectral region: technology fabrication and applications

We present research investigations in the field of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scientific instrumentation. We discuss normal incidence multilayer optics in the spectral region of “water window”, multilayer optics for collimation and focusing of hard X-ray, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography (ψ-13nm) and short period multilayer optics.     

A method for measuring the shape of a surface of an ellipsoid of rotation on a Talysurf CCI 2000 interference microscope

A method for measuring the shape of the surface of an ellipsoid of rotation on a Talysurf CCI 2000 white-light scanning interference microscope is presented. The measurement results are compared to alternative measurements. It is shown that the measurement results are quite consistent.     

Measurement Error of Interferometers with Diffraction Reference Wave

Technical Physics - An experimental setup and results on aberration of sources of a reference spherical wave (SRSW) based on a single-mode optical fiber with a subwavelength output aperture...     

A method for manufacturing multilayer mirrors in the form of the sector of revolution figure for hard X-rays

A two-stage method for manufacturing multilayer mirrors in the form of the sector of revolution figure is presented. The method is to fabricate a mirror in the form of concave paraboloid of revolution for wavelength λ = 0.154 nm. The collimating mirror’s properties are analyzed using a microfocus X-ray source.     

Measurement of the profile and curvature of cylindrical multilayer mirrors irradiated by a divergent X-ray beam

Two techniques for determining the local period and curvature of the surfaces of cylindrical multilayer mirrors are discussed. These techniques make it possible to measure the mentioned parameters of mirrors in a divergent X-ray beam with the wavelength λ = 0.154 nm and differ in the boundary conditions selected.     

Applying reactive ionic-beam etching to correcting the shape of X-ray mirrors

A procedure for correcting the shape of cylindrical surfaces by means of reactive ionic-beam etching is presented. The results from an experiment on manufacturing a glass surface as an elliptical cylinder are shown.     

A multilayer x-ray mirror in the form of an ellipsoid of revolution

Laboratory technology for the preparation of multilayer mirrors in the form of an ellipsoid of revolution for the hard x-ray wavelength range (λ = 0.1 nm) has been developed on the basis of the replica method. A prototype mirror in the form of a sector of an ellipsoid of revolution is prepared. Its shape and reflection characteristics are studied.     

Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures,Russian Academy of Sciences

A real opportunity for applying traditional optical methods to soft X-ray and extreme UV (ultraviolet) radiation bands has appeared thanks to recent successes in the area of multilayer-mirror deposition and procedures for fabricating supersmooth and highly precise substrates of mirrors. The implementation of this opportunity opens up fundamentally new prospectss in the nanodiagnostics of substances, micro- and nanoelectronics, microbiology, solar astronomy and other applications. The main directions in multilayer X-ray optics developed at the Institute for the Physics of Microstructures, Russian Academy of Sciences, are presented and the aspects of the use thereof in science and technology are considered. The main problems arising during the fabrication of multilayer interference structures for the soft X-ray and extreme UV bands are discussed. The main results obtained recently in the scope of each direction of investigation are presented. Plans for the future development of these directions are discussed.     

Multilayer mirror systems to form hard X-ray beams

This paper is an overview of the research activities carried out in the past five years at the Institute for Physics of Microstructures RAS and “X-ray” Company towards the manufacture of multilayer mirror systems capable of forming X-ray beams in the subnanometer range of wavelengths. The systems fabrication technology is presented, including techniques for producing supersmooth surfaces of specified shape, methods of graded multilayer structure deposition on such surfaces, and the principles of designing optimal mirror parameters. The characteristics of a quadrelliptical reflector—a novel high light-gathering power four-corner focusing system—are reported.     

On creating multilayer X-ray focusing mirrors

We review the recent studies and results obtained in the last five years at the Institute for Physics of Microstructures (IPM) in the field of multilayer mirror construction for hard X-ray wavelength range ( 7n = 0.05—0.25 nm), E = 25—5 keV)). Mirrors with cylindrical and spheroidal shapes as well as Kirkpatrick-Baez cross systems are considered.