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A plasma jet has been developed which operates using radio frequency (rf) power and produces a stable homogeneous discharge at atmospheric pressure. Its discharge characteristics, especially the dependence of stable discharge operating range on the feed gas, were studied, and the electric parameters such as RMS current, RMS voltage and reflected power were obtained with different gas flows. These studies indicate that there is an optimum range of operation of the plasma jet for a filling with a gas mixture of He and O_2. Two "failure" modes of the discharge are identified. One is a filamentary arc when the input power is raised above a critical level, another is that the discharge disappears gradually as the addition of O_2 approaches 3.2%. Possible explanations for the two failure modes have been given. The current and voltage waveform measurements show that there is a clear phase shift between normal and failure modes. In addition, I-V curves as a function of pure helium and for 1% addition of oxygen have been studied. 相似文献
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常压射频冷等离子体是近年来广受关注的一种新兴技术,在薄膜沉积方面已体现出其巨大潜力,但由于等离子体本身反应的复杂性,使其在薄膜沉积方面的机理至今尚未完全清楚。本文旨在从光谱分析的角度,研究常压射频冷等离子体TEOS工艺沉积二氧化硅薄膜。实验中我们检测到了Si和C-H的特征峰,表明二氧化硅是由TEOS在等离子体中分解而形成的。同时还研究了不同输入功率下Si和C-H的特征峰强度的变化情况,并发现其变化规律与生长速率有着很好的相似性。在温度为200℃的条件下所生成的SiO2薄膜的折射率在1.47-1.48的范围内。 相似文献
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