基于平面螺旋电感的微型ICP激发源

随着微电子机械系统(MEMS)技术的发展,基于MEMS的光谱仪分光系统和光电检测系统研究报道日益增多,但是微型激发源的研究报道相对较少。文章介绍了一种基于表面微机械加工技术的微型电感耦合等离子体(ICP)激发源,其RF功耗在数瓦以下、氩气消耗量远低于常规ICP激发源。阐述了这种激发源的结构、加工工艺流程及性能指标。同时还介绍了作者设计制作的基于PCB工艺的微型ICP激发源,采用了平面螺旋电感线圈和平面梳状交指电容,在100 Pa氩气气压下用13.56 MHz,3.5 W射频功率激励点燃了等离子体火炬,给出了装置的外观微型ICP火炬的照片。最后展望了该微型的ICP激发源在光谱仪中的应用前景。     

A Microfabricated Inductively Coupled Plasma Excitation Source

A novel miniaturization of inductively coupled plasma （ICP） source based on printed circuit produced using micro-fabrication techniques is presented. The basic parameters of the novel ICP, including its radio frequency, power loss, size, and argon consumption are less than 1% of that for the case of atmospheric pressure ICP source. For example, at 100 Pa of argon gas pressure, the present ICP source can be ignited by using the rf power less than 3.5 W. Potential applications of the ICP is discussed.