新型双染料敏化的宽带光聚物全息特性研究

报道了一种新型、两种染料共同敏化的宽带响应光聚物材料.该材料使用孟加拉玫瑰红和亚甲基蓝作为联合光敏剂,由于混合染料的加入,使材料的感光光谱范围大大加宽.用四种波长的光对样品进行曝光,衍射效率均大于40%,最高可达80%,适合于多波长存储,分别用不同波长的激光在样品同一位置存储了四幅不同的图像,其再现图像效果良好,表明该材料是一种较理想的多波长全息存储材料.     

一种核黄素敏化的宽带全息记录材料

制备了一种核黄素敏化的以聚乙烯醇为基质的新型全息存储材料,并研究了材料的全息特性.用Ar+激光器激发的488 nm的蓝光对材料曝光,结果表明该材料具有较高的衍射效率和曝光灵敏度,衍射效率高达53%,灵敏度为3.3 cm2/J,折射率调制度为4.5×10－4.研究了材料的透过率与随时间和入射角度变化的关系,说明在曝光记录过程中有噪音光栅生成.在存储介质膜中存储了全息图像,再现图像较为清晰,说明该材料适合用作高密度全息存储介质.     

A wideband sensitive holographic photopolymer

A novel wideband sensitive dry holographic photopolymer sensitized by rose bengal (RB) and methylene blue (MB) is fabricated, the holographic storage characteristics of which are investigated under different exposure wavelengths. The result shows that the sensitive spectral band exceeds 200 nm in visible light range, the maximum diffraction efficiency under different exposure wavelengths is more than 40% and decreases with the decrease of exposure wavelength, the exposure sensitivity is not change with the exposure wavelength. This photopolymer is appropriate for wavelength multiplexing or multi-wavelength recording in digital holographic storage.     

干法在线处理全息存储材料

综述了干法在线处理全息存储材料在高密度数字全息存储中的应用。详细介绍了光折变材料、光致聚合物和光寻址聚合物的基本组成、全息存储性能及其优缺点等。最后,对干法在线处理全息存储材料的发展现状和前景进行了简要介绍。     

A new photopolymerizable holographic recording material based on acrylamide and N-hydroxymethyl acrylamide

new polyvinylalcohol-based photopolymeric holographic recording material has been developed. The recording is obtained by the copolymerization of acrylamide and N-hydroxymethyl acrylamide. Diffraction efficiencies near 50% are obtained with energetic exposure of 80mJ/cm². N-hydroxymethyl acrylamide can improve the optical quality of the film. With the increase of the concentration of N-hydroxymethyl acrylamide, the flatness of the film increases, scattering reduces and the straight image is clearer with a small distortion. The postexposure effect on the grating is also studied. The diffraction efficiency of grating increases further during postexposure, gradient of monomer exists after exposure.