RAMAN谱研究在退火和镍衬底上金刚石形核中甲烷的影响(英文)

藉助SEM和MICRO RAMAN ,我们研究了在退火和在镍衬底上金刚石形核中甲烷CH4 的影响。CH4 的浓度分别为 0 % ,0 5 % ,1 5 %和 2 5 % ,其中当甲烷浓度为 1 5 %时 ,金刚石在镍衬底上金刚石形核密度为 3× 1 0 8/cm2 ,这个结果高于以前的结果。金刚石膜的质量是好的。     

Si衬底上异质外延金刚石的初始阶段原子H的作用及其界面结构

用高分辨率电子能量损失谱方法研究了原子 Ｈ 与被 Ｃ２ Ｈ２ 吸附的 Ｓｉ（１００） 界面的相互作用．结果显示,在 Ｓｉ（１００） 界面上, Ｓｉ— Ｓｉ 二聚化键和 Ｃ２ Ｈ２ 中的 Ｃ— Ｃ 键被 Ｈ 原子打开,它们分别形成 Ｓｉ— Ｈ, Ｃ— Ｈ 键．用 Ａ Ｍ１ 量子化学方法,计算了 Ｃ２ Ｈ２ 和 Ｃ２ Ｈ４ 在 Ｓｉ（１００） 上的吸附结构,指出了 Ｃ２ Ｈ２ 在 Ｓｉ（１００） 上的吸附位置,进一步讨论了金刚石在 Ｓｉ 异质外延初始阶段的形核机制．计算结果显示：在原子 Ｈ 的作用下,可以显著地降低反应的活化能,有利于 Ｃ Ｈ３ 的产生和 Ｃ Ｈ３ 向 Ｓｉ 衬底的键连．计算结果与实验相符合．     

Nucleation of diamond on silicon wafers using C60 in the hot filament chemical vapour deposition system

Scanning electron microscopy and Raman shifts were used to study the process of diamond nucleation and growth using C60 in the hot filament chemical vapour deposition (HFCVD) system.The process of nucleation and growth of diamond films on silicon wafer using C60 as intermediate layer in HFCVD system is described.In order to increase the density of diamond nuclei on the wafers,it is not necessary to use negative bias.The UV-light pre-treatment is not beneficial for improving the diamond nucleation.The multi-layers of C60 molecules,but not a monolayer,can increase the density of diamond nuclei in the presence of H atoms.     

Vanadium oxide thin films deposited on indium tin oxide glass by radio—frequency magnetron sputtering

Highly oriented VO₂(B), VO₂(B) + V₆O₁₃ films were grown on indium tin oxide glass by radio-frequency magnetron sputtering. Single phase V₆O₁₃ films were obtained from VO₂(B) +V₆O₁₃ films by annealing at 480℃ in vacuum. The vanadium oxide films were characterized by x-ray diffraction and x-ray photoelectron spectra (XPS). It was found that the formation of vanadium oxide films was affected by substrate temperature and annealing time, because high substrate temperature and annealing were favourable to further oxidation. Therefore, the formation of high valance vanadium oxide films was realized. The V₆O₁₃ crystalline sizes become smaller with the increase of annealing time. XPS analysis revealed that the energy position for all the samples was almost constant, but the broadening of the V_2p3/2 line of the annealed sample was due to the smaller crystal size of V₆O₁₃.     

钒氧化物薄膜的拉曼散射

用射频磁控溅射以纯金属钒做靶材在氩氧混合气体中制备了钒氧化物 (VO2 (B)、V6O1 3、V2 O5)薄膜。报导了钒氧化物薄膜的拉曼光谱 ,结合这些钒氧化物不同的结构特点 ,对它们的拉曼光谱进行了分类讨论     

Si衬底上异质外延金刚石的初始阶段原子H的作用及其界面结构

用高分辨率电子能量损失谱方法研究了原子H与被C₂H₂吸附的Si(100)界面的相互作用.结果显示,在Si(100)界面上,Si—Si二聚化键和C₂H₂中的C—C键被H原子打开,它们分别形成Si—H,C—H键.用AM1量子化学方法,计算了C₂H₂和C₂H₄在Si(100)上的吸附结构,指出了C₂H_{2关键词：}