INVESTIGATION OF GROWTH CHARACTERISTICS OF MONOCRYSTALLINE C60 FILMS IN HELIUM GAS ENVIRONMENT

The growth characteristics of C₆₀ films were investigated in helium gas environment at pressures of 0, 2.667×10^-2 and 6.667×10^-2 Pa, respectively. X-ray diffraction results showed that perfectly (111) oriented monocrystalline C₆₀ films with large grains were successfully deposited on synthetic 1M phlogopite mica-fluorophlogopite (0Ol) plane at a substrate temperature of 160℃ when the helium gas pressure is 2.667×10^-2 Pa. The results indicated that under appropriate helium gas pressure, the energy change of C₆₀ molecules through collisions with helium atoms, and the decrease of the supersaturation of the vapor pressure in the vicinity of the substrate resulted in a quasi-thermodynamic equilibrium deposition system. As a result, well-structured monocrystalline C₆₀ films were deposited on (001) plane of the fluorophlogopite substrate.     

直流弧光放电化学气相沉积(CVD)法制备金刚石薄膜及其等离子体的光发射谱原位测量

应用直流弧光放电分解CH₄和H₂混合气体成功地实现了高速生长多晶金刚石膜,应用扫描电子显微镜、X射线衍射仪、Raman谱仪对所得样品进行检测和分析,为了弄清楚金刚石膜的生长机理,在实际生长环境下“原位”测量了不同条件下直流弧光等离子体的光发射谱,结果发现:高速生长金刚石膜的关键是该气相反应中有大量的原子H存在。     

INVESTIGATION OF GROWTH CHARACTERISTICS OF MONOCRYSTALLINE C60 FILMS IN HELIUM GAS ENVIRONMENT

The growth characteristics of C₆₀ films were investigated in helium gas environment at pressures of 0, 2.667×10^-2 and 6.667×10^-2 Pa, respectively. X-ray diffraction results showed that perfectly (111) oriented monocrystalline C₆₀ films with large grains were successfully deposited on synthetic 1M phlogopite mica-fluorophlogopite (0Ol) plane at a substrate temperature of 160℃ when the helium gas pressure is 2.667×10^-2 Pa. The results indicated that under appropriate helium gas pressure, the energy change of C₆₀ molecules through collisions with helium atoms, and the decrease of the supersaturation of the vapor pressure in the vicinity of the substrate resulted in a quasi-thermodynamic equilibrium deposition system. As a result, well-structured monocrystalline C₆₀ films were deposited on (001) plane of the fluorophlogopite substrate.     

In掺杂ZnO薄膜的制备及其特性研究

采用射频反应溅射技术在硅(100)衬底上制备了未掺杂和掺In的ZnO薄膜。掠角X射线衍射测试表明,实验中制备的掺In样品为ZnO薄膜。用X射线衍射仪、原子力显微镜和荧光分光光度计分别对两样品的结构、表面形貌和光致发光特性进行了表征,分析了In掺杂对ZnO薄膜的结构和发光特性的影响。与未掺杂ZnO薄膜相比,掺In ZnO薄膜具有高度的C轴择优取向,同时样品的晶格失配较小,与标准ZnO粉末样品之间的晶格失配仅为0．16％;掺In ZnO薄膜表面平滑,表面最大不平整度为7nm。在掺In样品的光致发光谱中观察到了波长位于415nm和433nm处强的蓝紫光双峰,对掺In样品的蓝紫双峰的发光机理进行了讨论,并推测出该蓝紫双峰来源于In替位杂质和Zn填隙杂质缺陷。     

用射频溅射技术在硅衬底上制备In掺杂ZnO薄膜

以金属锌(Zn)和金属铟(In)为靶材采用射频反应共溅射技术在硅(100)衬底上沉积了In掺杂ZnO薄膜。用X射线衍射仪、扫描电子显微镜(SEM)、热探针、四探针和荧光分光光度计分别对样品的结构、表面形貌、导电类型、电阻率和发光特性进行了分析表征。测试结果表明,实验中制备出的ZnO薄膜具有高度的c轴择优取向和小压应力(0.74GPa),薄膜表面平整。样品为n型导电,电阻率为1.6Ω·cm。在室温光致发光谱测量中,首次观察到位于415～433nm的强的蓝紫光双峰发射,发光双峰的半峰全宽约为400meV。讨论了In掺杂对薄膜发光特性的影响。     

传输线模型测量Au/Ti/p型金刚石薄膜的欧姆接触电阻率

采用传输线模型测量了重B掺杂p型金刚石薄膜(约10²⁰cm^-3)上Ti/A u欧姆接触电阻率ρ_c,测试了500℃退火前后及大电流情况下的I-V特性,研究 了退火对ρ_c的影响.结果表明,重掺杂和退火工艺是改善欧姆接触的有效手段. ρ_c随测试温度的变化表明金属/半导体接触界面载流子输运机制为隧道穿透.而 光照对ρ_c影响的分析表明金刚石可作为理想窗口材料.测试得到的最低ρ _c值约为10^-4Ωcm². 关键词： 金刚石薄膜 欧姆接触 接触电阻率     

埋入SiO_2薄膜中纳米Ge的光学、电学性质和室温可见光致发光

用射频共溅射技术和真空退火方法，制备出埋入ＳｉＯ２基质中纳米Ｇｅ的复合膜（ｎｃＧｅ／ＳｉＯ２），通过喇曼散射、Ｘ射线衍射、室温光致发光（ＰＬ）、紫外可见光近红外吸收及电导温度关系等测量手段，较系统地研究了该复合膜的光学、电学、薄膜结构和光致发光性质，在室温情况下得到了有多个弱峰的、不对称的宽带ＰＬ谱，主峰能量约为２０５ｅＶ，这一结果同量子限制效应符合     

离子注入和固相外延制备Si1-x-yGexCy半导体薄膜

用等离子体增强化学气相淀积(PECVD)生长了200nm的SiGe薄膜,然后将C离子注入SiGe层,经两步热退火处理制备了Si1-x-yGexCy三元合金半导体薄膜.应用卢瑟福背散射(RBS),傅里叶变换红外光谱(FTIR)和高分辨率x射线衍射(HRXRD)研究了薄膜的结构和外延特性.发现C原子基本处于替代位置,C原子的掺入缓解了SiGe层的压应变 关键词： Si1-x-yGexCy薄膜 离子注入 固相外延     

Preparation of transparent conductive ZnO:Tb films and their photoluminescence properties

Tb-doped Zinc oxide (ZnO:Tb) films were prepared by RF reactive magnetron sputtering of a Zn target with some Tb-chips attached. The results show that the appropriate Tb ions incorporated into ZnO films can improve the structural and electrical properties of ZnO films. Photoluminescence (PL) measurements show that the characteristic emission lines correspond to the intra-4f^n-shell transitions in Tb^{3+} ions at room temperature. Under the optimal conditions, the ZnO:Tb films were prepared with the lowest resistivity (ρ) of 9.34×10^{ -4}Ωcm, transmittance over 80% at the visible region and the strong blue emission.     

蓝光ZnO薄膜的特性研究

采用反应溅射法在n型硅（100）衬底上制备了ZnO薄膜,分别用X射线衍射仪、原子力显微镜和荧光分光光度计对样品的结构、表面形貌和光致发光特性进行了表征。X射线衍射结果表明,实验中制备出了应变小的c轴择优取向的ZnO薄膜;原子力显微镜观察表明,薄膜表面平整,颗粒大小约为50nm,为柱状结构,颗粒垂直于硅衬底表面生长;在室温光致发光（PL）谱中观察到了波长位于434nm处的较窄的强蓝光发射峰,该蓝光峰的半峰全宽约为50meV。对蓝光峰的发光机制进行了讨论,并推断出该蓝光峰来源于电子从Zn填隙缺陷能级向价带顶跃迁。