Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.     

基于多层膜偏振元件的软X射线磁光Faraday偏转测量

在北京同步辐射装置(BSRF)的3W1B软X射线光束线上利用自行研制的同步辐射软X射线综合偏振测量装置对Ni的M_2,3边附近(60—70 eV)进行了软X射线磁光(magneto-optical)法拉第效应(Faraday effect)的偏转测量,实验装置主要由起偏器,检偏器,样品架,圆形钕铁硼永磁铁和MCP探测器组成,偏振元件(起偏元件和检偏元件)均采用反射式非周期性Mo/Si宽带多层膜.实验采用反射起偏和反射检偏的模式,得到一系列能量范围在60—70 eV间的法拉第偏转角结果, 关键词： 软X射线 磁光Faraday效应 综合偏振测量装置 宽带多层膜     

磁控溅射制备的W,WSi2,Si单层膜和W/Si,WSi2/Si多层膜应力

采用直流磁控溅射技术制备了厚度约100 nm的W,WSi2,Si单层膜和周期约为20 nm,Si膜层厚度与周期的比值为0.5的W/Si,WSi2/Si周期多层膜.利用台阶仪对镀膜前后基底表面的面形进行了测试,计算并比较了不同膜系的应力值.结果表明:W单层膜表现出较大的压应力,而W/Si周期膜则表现为张应力.WSi2单层...     

多层膜劳厄透镜对8keV X射线的聚焦性能模拟研究

基于多层膜技术的劳厄(Laue)透镜能实现硬X射线纳米级聚焦,在X射线微纳分析领域具有重要的应用前景.基于衍射动力学理论,分析了X射线在多层膜劳厄透镜中的传播,计算了不同结构的多层膜劳厄透镜对8 keVX射线的聚焦性能.结果表明,最外层厚度为5 nm的倾斜多层膜劳厄透镜可获得5.7 nm的聚焦光斑和26%的平均衍射效率...     

Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range

Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.     

X射线天文望远镜的进展

综述了近年来X射线天文望远镜(如准直型望远镜、编码孔径望远镜、正入射周期多层膜望远镜、掠入射单层膜望远镜和掠入射非周期多层膜望远镜以及新型的“龙虾眼”型望远镜)的发展；阐述了各种X射线天文望远镜工作的原理和成像特点，指出各种X射线天文望远镜之间的性能是相互补充的；简要说明了国内近年来在X射线天文望远镜研究方面取得的进展，并展望了下一步工作．     

Design, Fabrication and Measurement of Ni/Ti Multilayer Used for Neutron Monochromator

Ni/Ti multilayers, which can be used for neutron monochromators, are designed, fabricated and measured. Firstly, their reflectivities are simulated based on the Nevot-Croce model. Reflectivities of two Ni/Ti multilayer mirrors with periods d = 10.3 nm （M1） and d = 7.8 nm （M2） are calculated. In the calculation, the reflectivity of the Ni/Ti multilayer is taken as a function of the gazing angle with different roughness factors δ =1.0 nm and = 1.5 nm. Secondly, these two multilayers are fabricated by the direct current magnetron sputtering technology. Thirdly their structures are characterized by small-angle x-ray diffraction. The roughness factors are fitted to be 0.68 nm and 1.16nm for M1 and M2, respectively. Finally their reflective performances are measured on the V14 neutron beam line at the Berlin Neutron Scattering Centre （BENSC）, Germany. The experimental data show that the grazing angle of the reflected neutron intensity peak increases, but the reflected neutron intensity decreases, with the decreasing periods of the multilayers.     

Multilayers with high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm

The multilayer （ML） mirror with high-reflectivity （HR） at a specific emission line of 19.5 nm （Fe line） and low-reflectivity （LR） at 30.4 nm （He line） is needed to be designed and fabricated for observing the image of sun. Based on a variety of optimizations utilized different structures, the design is performed and the final results demonstrate that the reflectivity at 30.4 nm does not achieve minimum value when the reflectivity at 19.5 nm reaches the maximum value. The tradeoff should be done between the HR at 19.5 nm and LR at 30.4 nm. One optimized mirror is fabricated by direct current magnetron sputtering and characterized by grazing-incident X-ray diffraction （XRD） and synchrotron radiation （SR）. The experimental results demonstrate that the ML achieves the reflectivity of 33.3% at 19.5 nm and of 9.6× 10-4 at 30.4 nm at the incident angle of 13°.     

液体表面的遮光效应及其应用

首次发现了液体介质表面的遮光效应,讨论了遮光半径与液体介质性质的关系.基于这一发现,建立了一种测量液体折射率的新方法,该方法具有实时、自动化、高精度等特点.     

B_4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱradiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5℃. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.