排序方式: 共有2条查询结果,搜索用时 0 毫秒
1
1.
The study of amorphous incubation layers during the growth of microcrystalline silicon films under different deposition conditions 下载免费PDF全文
<正>The structural un-uniformity of μc-Si:H films prepared using a very high frequency plasma-enhanced chemical vapour deposition method has been investigated by Raman spectroscopy,spectroscopic ellipsometer and atomic force microscopy.It was found that the formation of amorphous incubation layer was caused by the back diffusion of SiH_4 and the amorphous induction of glass surface during the initial ignition process,and growth of the incubation layer can be suppressed and uniformμc-Si:H phase is generated by the application of delayed initial SiH_4 density and silane profiling methods. 相似文献
2.
1