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Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target
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A two-dimensional particle-in-cell simulation is used to
study the time-dependent evolution of the sheath surrounding a
prolate spheroid target during a high voltage pulse in plasma source
ion implantation. Our study shows that the potential contour lines
pack more closely in the plasma sheath near the vertex of the major
axis, i.e. where a thinner sheath is formed, and a non-uniform total
ion dose distribution is incident along the surface of the prolate
spheroid target due to the focusing of ions by the potential
structure. Ion focusing takes place not only at the vertex of the
major axis, where dense potential contour lines exist, but also at
the vertex of the minor axis, where sparse contour lines exist. This
results in two peaks of the received ion dose, locating at the
vertices of the major and minor axes of the prolate spheroid target,
and an ion dose valley, staying always between the vertices, rather
than at the vertex of the minor axis. 相似文献
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