Transient saturation absorption spectroscopy excited near the band gap at high excitation carrier density in GaAs

Transient saturation absorption spectroscopy in GaAs thin films was investigated using femtosecond pump and supercontinuum probe technique at excitation densities higher than 1×10^{19}cm^{-3}. The Coulomb enhancement factor of the electron－hole plasma results in a spectrum hole at the pump wavelength. Two distinct transmission peaks at two sides of the pump wavelength are observed, arising from the bleaching of transitions from the heavy- and light-hole bands to the conduction band. The dynamic process of the transient saturation absorption is fitted using a bi-exponential function. The fast decay process is dominated by the carrier-phonon scattering and the slow process may be attributed to the electron－hole recombination.     

离子注入对InAs/GaAs量子点光学效质的影响

研究了低能质子注入诱导的界面混合和快速热退火对量子点发光效率的影响，对其光致发光 峰强进行了拟合计算.研究发现量子点的发光峰强度主要由载流子俘获时间和非辐射复合寿 命决定.由于后退火处理能够部分的消除因质子注入造成的缺陷，量子点中非辐射复合中心 浓度与注入剂量成亚线性关系；退火温度越高，非辐射复合中心被消除越多，亚线性程度越 高.界面混合导致的俘获效率的增加和注入损伤引起的非辐射复合是相互竞争过程，存在一 个临界的注入剂量N_C，当注入剂量N小于N_C，界面混合作 用较为明显，量子点 发光峰强随注入剂量增加而增强；当N大于N_C时，质子注入引起了大量的非 辐射复合 中心，主要表现为注入损伤，量子点的发光峰强随注入剂量增加而迅速减弱.退火温度越高 ，N_C越大. 关键词： 量子点 离子注入 峰强