Simulation of surfactant effect on growth of metal homoexpitaxial Sb－Ag/Ag(111)

A kinetic Monte Carlo simulation is performed in order to study the effect of Sb atoms as a surfactant on the growth of Ag on Ag(111). In our model the repulsive mechanism in which the surfactant Sb atoms repel diffusing Ag adatoms, and the exchange mechanism between Ag and Sb atoms, are considered. Our simulations show that the effects of Sb atoms for Ag/Ag(111) growth system are mainly to increase the chances for Ag atoms to overcome the Ehrlich--Schwoebel barrier both in the interlayer growth and along the edge diffusion. The influence of the coverage of Sb atoms and substrate temperature on the growth of Ag/Sb/Ag(111) is discussed.     

Simulation of surfactant effects on the growth of metal homoexpitaxial Sb-Ag/Ag(111)

A kinetic Monte Carlo simulation is performed in order to study the effect of Sb atoms as a surfactant on the growth of Ag on Ag(111).In our model the repulsive mechanism in which the surfactant Sb atoms repel diffusing Ag adatoms,and the exchange mechanism between Ag and Sb atoms,are considered.Our simulations show that the effects of Sb atoms for Ag/Ag(111) growth system are mainly to increase the chances for Ag atoms to overcome the Ehrlich-Schwoebel barrier both in the interlayer growth and along the edge diffusion.The influence of the coverage of Sb atoms and substrate temperature on the growth of Ag/Sb/Ag(111) is discussed.     

Ge/Pb/Si(111)生长中Ge原子沿团簇边缘扩散的三维Monte-Carlo模拟

用动态Monte-Carlo方法对Ge在单层表面活性剂Pb覆盖的Si(111)表面上沿团簇边缘扩散进行三维模拟.重点讨论Ge原子是否沿团簇边缘扩散,沿边缘扩散时的最大扩散步数及最近邻原子数对三维生长的影响,并计算薄膜表面粗糙度研究三维生长模式.模拟表明Ge沿团簇边缘扩散的行为对薄膜生长模式的影响很大,同时讨论了ES势对三维生长模式的影响.     

稳恒磁场下金属电沉积枝晶生长的模拟

采用Monte-Carlo模拟方法,给出用于描述稳恒磁场作用下电沉积枝晶生长的模型.该模型综合考虑了外加磁场B,电解溶液浓度和离子在阴极发生还原反应的几率P_s等因素对电沉积过程的影响,模拟得到与实验结果一致的枝晶生长图形.模拟结果表明:团簇的形状和它们的分形维数都与外加磁场B的强弱,即体现在模型中离子的旋转角速度ω的大小有关;随着磁场强度的增加,沉积团簇会从分形向非分形转变;在相对强的外加磁场作用下,较高离子浓度时的沉积物是非分形的;离子在阴极的反应概率P_s越小,随着磁场强度的增加枝晶生长越易趋向非分形.