激光干涉法诊断空气开关等离子体的技术研究

介绍了激光干涉技术用于诊断等离子体的基本原理、实验装置及图像处理方法等,通过Mach-Zehnder激光干涉仪诊断了空气开关等离子体。结果表明,该实验装置能够获得高质量的干涉图。通过对干涉图的数值处理,重建了等离子体电子密度的三维分布。空气开关放电后75ns时刻,等离子体的平均电子密度为2×10~(18) cm~(-3),电子温度为0.11eV,等离子体半径为1.1mm,扩散速度为1.4×10~4 m/s。     

高功率脉冲磁控溅射技术制备掺氮类金刚石薄膜的磨蚀性能

掺氮类金刚石薄膜在生物应用中很有前景,研究其摩擦和腐蚀的协同作用有很大的实际意义.论文使用高功率脉冲磁控溅射(high-power impulse magnetron sputtering,HiPIMS)技术,在奥氏体不锈钢和单晶硅片上以Ar气和氮气为前驱气体,室温下制备了致密的掺氮类金刚石薄膜.使用配备三电极电化学池的往复型摩擦磨损试验机,在Hank’s平衡盐溶液中研究了不同靶脉冲持续时间制备的薄膜的摩擦腐蚀性能,并在滑动之前、期间和之后监测了薄膜的开路电位(open circuit potential,OCP).电化学工作站用于表征摩擦前薄膜的电化学行为.结果表明:60μs制备的掺氮类金刚石薄膜展示了优异的耐磨蚀性能,其摩擦系数最低(0.05)且在摩擦阶段OCP显示了最高的稳定值(39 mV),这主要归功于其致密的结构和较大的表面能;而90μs下制备的薄膜由于可以形成交联结构的sp³键含量明显下降,从而导致薄膜孔隙率增加,薄膜的抗腐蚀性下降,在磨蚀过程中由于电解液在孔隙的腐蚀使得薄膜/基体的界面结合强度减弱,在摩擦的综合作用下,薄膜脱落,发生失效.     

Preparation and Photocurrent Performance of Highly Ordered Titania Nanotube Implanted with Ag/Cu Metal Ions

Ag/Cu-doped titania nanotubes （Ag/TiNT, Cu/TiNT） are prepared by a metal vapor vacuum arc implanter. A scanning electronic microscope is employed for microstruetural characterization. The photo-current performance of doped titania nanotubes under UV and visible light is tested by an electrochemical workstation CS300UA, the results show that the absorption edge of both Ag/TiNT and Cu/TiNT samples shifts to the visible light region and the band gap becomes narrower. Ag/TiNT possesses better photo-current ability than Cu/TiNT under UV and visible light. Titania doped with Ag and Cu metal ions is also studied based on the linearized augmented planewave method implemented by WIEN2k package, the result becomes better with the experimental performance.     

Calculation of Electronic Structure of Anatase TiO2 Doped with Transition Metal V,Cr,Fe and Cu Atoms by the Linearized Augmented Plane Wave Method

The electronic density of states and band structures of doped and un-doped anatase TiO2 were studied by the Linearized Augmented Plane Wave method based on the density functional theory. The calculation shows that the band structures of TiO2 crystals doped with transition metal atoms become narrower. Interesting, an excursion towards high energy level with increasing atomic number in the same element period could be observed after doping with transition metal atoms.     

基于磁过滤技术TiAlCN/TiAlN/TiAl复合体系腐蚀及摩擦学性能

本文基于新型的磁过滤沉积技术(FCVA)研究了TiAlCN/TiAlN/TiAl多元复合涂层结构及不同C含量对其防腐耐磨性能的影响.同时使用SEM,XRD,XPS,电化学测试和摩擦磨损设备对其宏/微观性能进行了系统表征.实验结果表明:随C含量增加,C元素的存在形式从TiAlCN固溶相转化为TiAlCN固溶/非晶碳共存.典型的TiAlCN固溶/非晶碳纳米复合结构TiAlCN/TiAlN/TiAl涂层不仅具有超高硬度和高韧性,而且涂层中均匀无特征结构的非晶碳具有优异的自润滑效果,通过结合各层的优势,该结构涂层在3.5%NaCl电化学腐蚀试验中,E_corr提高了5.6倍,为0.271V,I_corr降低为原来的1/52,为8.092×10^-9 A·cm^-2;在干摩擦实验中,摩擦系数降低了1/3,为0.43,磨损率降低了1/1.4,为1.13×10^-5 mm³·N^-1·m^-1.