稀释磁性半导体Sn1-xMnxO2的室温铁磁性

采用固相反应法，制备了不同成分的稀释磁性半导体Sn_1-xMn_xO ₂(x=002，004，006)．利用x射线衍射和傅里叶变换红外光谱法证明 了锰均匀地掺杂到二氧化锡中．在室温下研究了掺锰二氧化锡基稀释半导体的磁性，发现它具有明显的铁磁性 ，同时对磁性的强弱与锰的含量和烧结温度的关系作了研究． 关键词： 稀释磁性半导体 掺杂 烧结 铁磁性 1-xMn_x O₂')" href="#">Sn_1-xMn_x O₂     

Enhancement of ferromagnetism in polycrystalline Si0.965Mn0.035:B films by boron plasma treatment

This paper reports that the polycrystalline Si0.965Mn0.035:B films have been prepared by cosputtering deposition followed by rapid thermal annealing for crystallization. The polycrystalline thin films consist of two ferromagnetic phases. The low temperature ferromagnetic phase with Curie temperature (Tc) of about 50 K is due to the Mn4Si7 phase in the films, while the high temperature one (Tc～250 K) is resulted from the incorporation of Mn into silicon. The films are treated by boron plasma excited with the approach of microwave plasma enhanced chemical vapor deposition for 40 minutes. After plasma treatment, it is observed that no extra magnetic phases or magnetic complexes exist in the films, while both the high temperature saturation magnetization and the hole concentration in the films increase. The obvious correlation between the magnetic properties and the electrical properties of the polycrystalline Si0.965Mn0.035:B films suggests that the hole carriers play an important role in Si:Mn diluted magnetic semiconductors.     

多晶Si0.9654Mn0.0346:B薄膜的磁性研究

利用磁控溅射和快速热处理的方法制备了Mn,B共掺的多晶硅薄膜(Si_0.9654Mn_0.0346:B).磁性和结构研究发现薄膜有两个铁磁相.低温铁磁相来源于杂相Mn₄Si₇,高温铁磁相(居里温度T_C～250K)是由Mn原子掺杂进入Si晶格导致.晶化后的薄膜利用射频等离子体增强化学气相沉积系统(PECVD)进行短暂(4min)的氢化处理后发现,薄膜的微结构没有发生变化而饱和磁化强度却随着 关键词： 磁性半导体 硅 氢化     

多晶Si0.9654Mn0.0346:B薄膜的磁性研究

利用磁控溅射和快速热处理的方法制备了Mn,B共掺的多晶硅薄膜(Si0.9654Mn0.0346:B).磁性和结构研究发现薄膜有两个铁磁相.低温铁磁相来源于杂相Mn4Si7,高温铁磁相(居里温度TC～250K)是由Mn原子掺杂进入Si晶格导致.晶化后的薄膜利用射频等离子体增强化学气相沉积系统(PECVD)进行短暂(4min)的氢化处理后发现,薄膜的微结构没有发生变化而饱和磁化强度却随着载流子浓度的增大而增大.样品的饱和磁化强度和载流子浓度密切相关为验证在硅基磁半导体中磁性是以空穴为媒介的这一理论提供了有力的证据.     

Effect of hydrogenation time on magnetic and electrical properties of polycrystalline Si0.956Mn0.044:B thin films

This paper reports that polycrystalline Si 0.956 Mn 0.044 :B films have been prepared by cosputtering deposition followed by rapid thermal annealing for crystallization. The polycrystalline thin films were treated by hydrogen plasma excited with approach of radio-frequency plasma enhanced chemical vapour deposition for different time of 10 minutes, 15 minutes and 40 minutes. After hydrogenation, the structural properties of the films do not show any change, while both the saturation magnetization and the hole concentration in the films increase at first, then decrease with the increase of hydrogenation time. The obvious correlation between the magnetic properties and the transport properties of the polycrystalline Si 0.956 Mn 0.044 :B films suggests that a mechanism of hole-mediated ferromagnetism is believed to exist in Si-based diluted magnetic semiconductors.     

Effect of annealing atmosphere on ferromagnetism in Mn doped ZnO films

This paper reports that Zn_0.97Mn_0.03O thin films have been prepared by radio-frequency sputtering technology followed by rapid thermal processing in nitrogen and oxygen ambient respectively. Magnetic property investigation indicates that the films are ferromagnetic and that the Curie temperature (T_c) is over room temperature. It is observed that the saturation magnetization of the films increases after annealing in nitrogen ambience but decreases after annealing in oxygen. Room temperature photoluminescence spectra indicate that the amount of defects in the films differs after annealing in the different ambiences. This suggests that the ferromagnetism in Zn_0.97Mn_0.03O films is strongly related to the defects in the films.     

稀释磁性半导体Sn1-xMnxO2的室温铁磁性

采用固相反应法,制备了不同成分的稀释磁性半导体Sn1-xMnxO2(x=0.02,0.04,0.06).利用x射线衍射和傅里叶变换红外光谱法证明了锰均匀地掺杂到二氧化锡中.在室温下研究了掺锰二氧化锡基稀释半导体的磁性,发现它具有明显的铁磁性,同时对磁性的强弱与锰的含量和烧结温度的关系作了研究.