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Simulation of near-infrared photodiode detectors based on β-FeSi_2/4H-SiC heterojunctions 总被引:1,自引:0,他引:1
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In this paper,we propose a near-infrared p-type β-FeSi2/n-type 4H-SiC heterojunction photodetector with semiconducting silicide(β-FeSi2) as the active region for the first time.The optoelectronic characteristics of the photodetector are simulated using a commercial simulator at room temperature.The results show that the photodetector has a good rectifying character and a good response to near-infrared light.Interface states should be minimized to obtain a lower reverse leakage current.The response spectrum of the β-FeSi2/4H-SiC detector,which consists of a p-type β-FeSi2 absorption layer with a doping concentration of 1×1015cm-3 and a thickness of 2.5 μm,has a peak of 755 mA/W at 1.42 μm.The illumination of the SiC side obtains a higher responsivity than that of the β-FeSi2 side.The results illustrate that the β-FeSi2/4H-SiC heterojunction can be used as a near-infrared photodetector compatible with near-infrared optically-activated SiC-based power switching devices. 相似文献
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两种非晶碳化硅薄膜发光二极管 总被引:1,自引:0,他引:1
利用硅烷与甲烷的混合气在射频电场下的等离子体反应,淀积不同导电类型的非晶碳化硅薄膜,制成了p-i-n结注入型和均匀材料的碰撞电离型两种大面积发光二极管。本文报导这两种非晶发光器件的结构设计及光谱特性,并对器件的发光机现进行了讨论。 相似文献
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SiC1-xGex/SiC 异质结光电二极管特性的研究 总被引:5,自引:5,他引:0
使用二维器件模拟软件Medici, 对SiC1-xGex/SiC异质结的光电特性进行了模拟.设计了N型重掺杂SiC层的厚度为1 μm, P型轻掺杂SiC1-xGex层厚为0.4 μm, 二者之间形成突变异质结.在反向偏压3 V、光强度为 0.23 W/cm2的条件下, p-n+ SiC0.8Ge0.2/SiC和p-n+ SiC0.7Ge0.3/SiC敏感波长λ分别可以达到0.64 μm和0.7 μm, 光电流分别为7.765×10-7 A/μm和7.438×10-7 A/μm; 为了进一步提高SiC1-xGex/SiC 异质结的光电流, 我们把p-n+两层结构改进为p-i-n三层结构.在同样的偏压、光照条件下, p-i-n SiC0.8Ge0.2/SiC和p-i-n SiC0.7Ge0.3/SiC的光电流分别达到1.6734×10-6 A/μm和1.844×10-6 A/μm. 相似文献
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在对SiC1-xGex三元合金主要特性的研究基础上,利用器件仿真器MEDICI模拟和分析SiCGe/SiC异质结光电二极管的光电特性。计算表明, SiC1-xGex 在Ge组分为0.3时与3C-SiC晶格失配较小,此时的SiCGe/SiC异质结对可见光和近红外光有较好的光谱响应。当P型SiC1-xGex层杂质浓度为1×1015cm-3、厚度1.6μm、x=0.3时,SiC1-xGex /SiC异质结光电二极管对0.52μm可见光有250mA/W左右的响应度,对0.7μm近红外光也有102mA/W左右的响应度。 相似文献
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采用低压热壁化学气相沉积法,在6H-SiC衬底(0001)面上生长了不同温度(1100—1250℃),不同GeH4流量比(6.3%—25%)的SiCGe薄膜样品,研究了SiCGe薄膜的表面形貌、生长特性以及样品中Ge组分含量的变化. 扫描电镜测试结果表明,SiCGe薄膜在低温下倾向于岛状生长模式,随着生长温度提高,岛状生长逐渐过渡到层状生长模式,同时伴有岛形状和密度的变化. X射线光电子能谱测试得出SiCGe样品中的Ge含量约为0.15%—0.62%,在其他参数不变的情况下,样品的G
关键词:
碳化硅
化学气相沉积
反相边界
岛状生长 相似文献
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Optically controlled SiCGe/SiC heterojunction transistor with charge-compensation layer 总被引:1,自引:0,他引:1
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A novel optically controlled SiCGe/SiC heterojunction transistor with charge-compensation technique has been simulated by using commercial simulator.This paper discusses the electric field distribution,spectral response and transient response of the device.Due to utilizing p-SiCGe charge-compensation layer,the responsivity increases nearly two times and breakdown voltage increases 33%.The switching characteristic illustrates that the device is latch-free and its fall time is much longer than the rise time.With an increase of the light power density and wavelength,the rise time and fall time will become shorter and longer,respectively.In terms of carrier lifetime,a compromise should be made between the responsivity and switching speed,the ratio of them reaches maximum value when the minority carrier lifetime equals 90 ns. 相似文献
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