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研究了衬底温度对MOCVD技术制备的ZnO薄膜的微观结构和光电特性影响. XRD和SEM的研究结果表明,衬底温度对ZnO薄膜的微观结构有显著影响,明显的形貌转变温度大约发生在175℃,低于175℃,薄膜呈镜面结构,晶粒为球状,高于177℃的较高温度范围,薄膜从“类金字塔”状的绒面结构演化为“岩石”状显微组织;随着温度增加,薄膜的晶粒尺寸明显增大.绒面结构的未掺杂ZnO薄膜具有17.96 cm2/V·s的高迁移率和3.28×10-2 Ω·cm的低电阻率,对ZnO薄膜的进一步掺杂和结构优化有望应用于Si薄膜太阳电池的前电极.
关键词:
MOCVD
ZnO薄膜
透明导电氧化物
太阳电池 相似文献
3.
Open-circuit voltage analysis of p-i-n type amorphous silicon solar cells deposited at low temperature
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This paper identifies the contributions of p-a-SiC:H layers and i-a-Si:H layers to the open circuit voltage of p-i-n type a-Si:H solar cells deposited at a low temperature of 125 C.We find that poor quality p-a-SiC:H films under regular conditions lead to a restriction of open circuit voltage although the band gap of the i-layer varies widely.A significant improvement in open circuit voltage has been obtained by using high quality p-a-SiC:H films optimized at the "low-power regime" under low silane flow rates and high hydrogen dilution conditions. 相似文献
4.
采用直流脉冲磁控溅射方法,在室温下生长氢化Ga掺杂ZnO薄膜(GZO/H),并通过湿法后腐蚀技术获得绒面结构.研究了室温下H2流量对薄膜结构、光电性能及表面形貌的影响.实验表明,氢化GZO(GZO/H)薄膜具有良好的(002)晶面择优取向生长,引入适当流量的H2可以有效提高薄膜的电学特性,GZO/H薄膜具有更低的电阻率以及较高的迁移率和载流子浓度.当通入H2流量为6 sccm时,薄膜电阻率为6.8 ×10-4 Ω·cm,Hall迁移率达34.2 cm2/Ⅴ·s,制备的GZO/H薄膜可见光区域平均透过率优于85;.此外,研究了H2流量对湿法腐蚀后绒面GZO/H薄膜表面形貌的影响,提出了一种薄膜绒面结构形成过程模型. 相似文献
5.
本文研究了薄膜厚度对MOCVD技术制备未掺杂ZnO薄膜的微观结构和电学特性影响.XRD和SEM的研究结果表明,随着薄膜厚度的增加,ZnO薄膜(110)峰趋于择优取向,且晶粒逐渐长大,薄膜从球状和细长棒状演变为具有类金字塔绒面结构特征的ZnO薄膜;Hall测量表明,较厚的ZnO薄膜有助于提高薄膜电学特性,可归于晶粒长大和晶体质量提高.40min沉积时间(膜厚为1250nm)制备出的ZnO薄膜具有明显绒面结构,其晶粒尺寸为300~500nm,电阻率为7.9×10-3Ω·cm,迁移率为26.8cm2/Vs. 相似文献
6.
Bandgap engineering of semiconductor nanomaterials is critical for their applications in nanoelectronics, optoelectronics, and photonics. Here we report, for the first time, the growth of single-crystalline quaternary alloyed Ga_(0.75)In_(0.25)As_(0.49)Sb_(0.51) nanowires via a chemical-vapor-deposition method. The synthesized nanowires have a uniform composition distribution along the growth direction, with a zinc-blende structure. In the photoluminescence investigation,these quaternary alloyed semiconductor nanowires show a strong band edge light emission at 1950 nm(0.636 e V). Photodetectors based on these alloy nanowires show a strong light response in the near-infrared region(980 nm) with the external quantum efficiency of 2.0 × 10~4% and the responsivity of 158 A/W. These novel near-infrared photodetectors may find promising applications in integrated infrared photodetection, information communication, and processing. 相似文献
7.
实验采用脉冲磁控溅射法制备铝掺杂氧化锌(AZO)薄膜.为了进一步提高AZO薄膜的光电性能,在溅射过程中加入一定流量的氢气,以高纯ZnO ∶Al2O3陶瓷靶为溅射靶材,制备AZO/H透明导电薄膜.通过测试薄膜的结构特性、表面形貌及其光电性能,详细地研究了氢气流量对AZO薄膜性能的影响.溅射过程中引入氢气,可以促进薄膜的晶化,提高薄膜的迁移率和透过率(400—1100 nm).采用纯氩气溅射制备AZO薄膜的电阻率为5.664×10-4 Ω·cm
关键词:
氧化锌
氢气流量
磁控溅射
太阳电池 相似文献
8.
Influence of the total gas flow rate on high rate growth microcrystalline silicon films and solar cells
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This paper reports that high-rate-deposition of microcrystalline
silicon solar cells was performed by very-high-frequency
plasma-enhanced chemical vapor deposition. These solar cells, whose
intrinsic μ c-Si:H layers were prepared by using a different total gas
flow rate (Ftotal), behave much differently in performance,
although their intrinsic layers have similar crystalline volume
fraction, opto-electronic properties and a deposition rate of ~
1.0~nm/s. The influence of Ftotal on the micro-structural
properties was analyzed by Raman and Fourier transformed infrared
measurements. The results showed that the vertical uniformity and
the compact degree of μ c-Si:H thin films were improved with
increasing Ftotal. The variation of the microstructure was
regarded as the main reason for the difference of the J--V
parameters. Combined with optical emission spectroscopy, we
found that the gas temperature plays an important role in
determining the microstructure of thin films. With Ftotal
of 300~sccm, a conversion efficiency of 8.11% has been obtained
for the intrinsic layer deposited at 8.5~\AA/s (1~\AA=0.1\,nm). 相似文献
9.
采用直流脉冲反应磁控溅射方法生长W掺杂ZnO(WZO)透明导电氧化物薄膜并研究了衬底温度对薄膜微观结构、组分、表面形貌以及光电性能的影响.实验结果表明,WZO薄膜具有良好的(002)晶面择优取向,且适当的衬底温度是制备优质WZO薄膜的关键因素.随着衬底温度升高,薄膜表面粗糙度先增大后减小;衬底温度较高时,薄膜的结构致密,结晶质量好,电子迁移率高.当衬底温度为325℃时,WZO薄膜获得最低电阻率9.25×10-3Ω·cm,方块电阻为56.24Ω/□,迁移率为11.8 cm2 V-1·s-1,其在可见光及近红外区域(400—1500 nm)范围的平均透过率达到85.7%. 相似文献
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