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采用精细雾化施液CMP这一抛光工艺对氧化锆陶瓷进行抛光,实验研究了抛光液中具有代表性的酸碱调节剂对抛光氧化锆陶瓷材料去除率、表面形貌和表面粗糙度的影响及酸碱性对精细雾化施液分散稳定性的影响.结果表明:针对精细雾化液抛光工艺配制的二氧化硅抛光液在碱性环境中分散稳定性更好,虽然酸性抛光液对材料去除率更高,但酸对氧化锆陶瓷表面腐蚀性过大,不宜抛光氧化锆陶瓷;有机碱作为调节剂抛光后的表面质量明显优于无机碱及无机酸、有机酸;乙二胺配置的碱性抛光液精细雾化后抛光氧化锆陶瓷可获得优质超光滑低损伤表面及较高加工效率,表面粗糙度Rq为1.67 nm,材料去除率达182.23 nm/min. 相似文献
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本文的记号沿用〔1〕中的.令B”CC“是单位球,:、。于户,:·匆=习二叭. ‘.1Vf=(f二,,…,了:。),其中介‘=af丽’d。(:)为C“=RZ”上不一测度,且使v(B“)二1 .B”上Diriehlet空间的定义如下〔2〕: D“=={f{l在B,上全纯,f(0)=o,}ljl}’==J,.v了·示。(2)之下成为一个H*lbe·t空间.},.vj.初·相似文献
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In the present work we investigated a novel triplet ground-state germylenoid HB=GeLiF as well as its insertion reactions with RH(R = F,OH and NH2) using the DFT B3LYP and QCISD methods for the first time.Geometry optimization calculations show that the triplet HB=GeLiF has three equilibrium structures,in which the four-membered ring structure is the most stable with the lowest energy.All mechanisms of the three insertion reactions of germylenoid HB=GeLiF with RH(R = F,OH,and NH2) are identical to each other.Based on the calculated results,it is concluded that under the same conditions the insertion reactions should occur easily in the order of H-F > H-OH > H-NH2.In THF solvent the insertion reactions get more difficult than in the gas phase. 相似文献
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可聚合添加剂和极压添加剂对矿物油极压抗磨和抗疲劳性能的影响 总被引:1,自引:0,他引:1
选用重极压齿轮油和二聚酸 /司本 - 80添加剂制备了多种不同配比的油样 ,进行了疲劳和胶合试验 ,同时分析了磨损表面形貌和抗磨机理 .结果表明 :聚合添加剂的耐疲劳性能较好 ,其与极压添加剂经合理复配可以更好地提高油样的耐疲劳及抗胶合综合性能 .这是两类添加剂协同作用的结果 相似文献
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