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1.
Julius Zellner 《Monatshefte für Chemie / Chemical Monthly》1918,39(1-2):87-94
Ohne Zusammenfassung 相似文献
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In this paper the effects of surface roughness and annealing temperature (T) of latex coating films on adhesion are discussed for the different stages of the film formation process. The surface free energy of latex films was assessed in terms of practical work of adhesion (W) (or adherence) using a custom-built adhesion-testing device (ATD), atomic force microscopy (AFM), and contact angle measurements. For preannealed latex films surface roughness averages (Ra) were determined from AFM height images and were related to the values of W obtained from ATD measurements at room temperature. The results obtained using these tests exhibiting surface behavior on different length scales indicate a dependence of the measured adhesion on surface roughness and temperature, as well as on the length scale of the measurements.First preannealed samples were studied, which were obtained by heat treatment above the respective glass transition temperatures (Tg). Increasing the temperature of preannealing resulted in a decrease of the adherence observed in ATD experiments at room temperature. However, on the nanoscale, using AFM, no significant variation of the adherence was observed. This observation can be explained by roughness arguments. Preannealing decreases roughness which results in lower adherence values measured by ATD while for essentially single asperity AFM experiments roughness has an insignificant effect. Specimens were also annealed over a constant period of time (90 min) at different temperatures. At the end of the heat treatment, adhesion was measured at the treatment temperature by ATD. The amplified effect of temperature observed in this case on adherence is attributed to the combination of roughness decrease and increasing test temperature. In a third set of experiments completely annealed samples were studied by ATD as well as by AFM as a function of temperature. With increasing T values ATD showed a decrease in adherence, which is attributed to a decreasing surface free energy of the annealed films at elevated T values. AFM, on the other hand, showed an opposite trend which is assigned to increasing penetration of the tip into the tip/wetting polymer samples versus increasing temperature. Finally, annealing isotherms as a function of time were investigated by ATD in situ at different temperatures. This last set of experiments allowed us to optimize annealing time and temperature to achieve complete curing. 相似文献
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Julius König 《Mathematische Annalen》1878,14(2):212-230
Ohne Zusammenfassung 相似文献
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The strain energies and through-space distances between the two bridgehead E atoms of a selection of 1,3-dimethyl-1,3-ditetrelbicyclo[1.1.1]pentanes
(tetrel E = Si, Ge or Sn) were examined by quantum chemical calculations at MP2 and B3LYP levels. The aim is to identify which
bridges lead to short through-space E,E distances, and simultaneously, to as low strain as possible. A short E,E distance
should improve through-space interaction, and a low strain should promote the thermal stability and possibly also facilitate
their synthesis. The bridges examined included CH2, CMe2, CtBu2, C(CH2)n (n = 2–4), O, NMe, S, PMe, SiMe2, GeMe2, and SnMe2. The calculations indicate that the phospha bridge is a good compromise providing reasonably low strain as well as E,E through-space
distances which are only longer than normal E–E single bonds by factors of 1.06–1.10.
This paper is dedicated to Professor Mitsuo Kira in recognition of his stimulating Si chemistry and his 2005 Wacker Award. 相似文献
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Abstract— Understanding of reaction mechanisms in photochemistry is advanced both by kinetic measurements to determine rates of reaction and by spectroscopic studies of the structures of precursors and photoproducts. When kinetics and spectroscopy are combined in a time-resolved, multiwavelength spectroscopic measurement on a reacting system, spectra and structures of intermediates can also be determined. In this paper, the application of multidimensional least-squares and factor analysis techniques for resolving overlapped spectra from intermediates in photochemical kinetics are discussed. The methods are employed specifically to resolve Raman spectra of intermediates in triplet-state photoreactions. By varying excitation intensity, spectra of excited-triplet states are resolved from ground states and solvent. By varying the concentration of a triplet quencher in the sample, the Raman spectrum of a sensitizer excited state (benzophe-none) can be resolved from those of acceptor-triplet states or radical photoproducts. Applications of these concepts in other areas of photochemical kinetics are addressed. 相似文献