一类非线性双曲—抛物耦合方程组的周期边值问题

§1 引言在循环燃料反应堆中,其中心密度u及温度v满足下列方程组:     

概率论在就业决策中的一个应用

随着科学技术的飞速发展，生产力水平正在不断提高，各行各业的就业岗位已经远远不能满足即将从业者的需求，就业“供”与“需”之间的予盾越来越突出．对于一名即将从业的人（尤其是即将毕业的大学生）来说，面对强手如林的竞争局面，除了刻苦学习必备的基础知识，努力训练从业的基本技能以外，在竞争工作岗位时，如何进行就业的决策，也是一个不容忽视的问题．本文通过几种具体情况，对这个问题进行一点探讨．     

激光雷达中层大气遥感技术

介绍了中科院武汉物理与数学研究所瑞利激光雷达的技术特点，并从其对武汉地区中层大气密度和温度廓线探测的典型结果，给出了该激光雷达对中层大气主要参数的探测能力。     

Effects of Substrate Temperature on Helium Content and Microstructure of Nanocrystalline Titanium Films

Helium-charged nanocrystalline titanium films have been deposited by HeAr magnetron co-sputtering. The effects of substrate temperature on the helium content and microstructure of the nanocrystalline titanium films have been studied. The results indicate that helium atoms with a high concentration are evenly incorporated in the deposited titanium films. When the substrate temperature increases from 60℃ to 350℃ while the other deposition＇parameters are fixed, the helium content decreases gradually from 38.6 at.% to 9.2at.%, which proves that nanocrystalline Ti films have a great helium storage capacity. The 20 angle of the Bragg peak of （002） crystal planes of the He-charged Ti film shifts to a lower angle and that of （100） crystal plane is unchanged as compared with that of the pure Ti film, which indicates that the lattice parameter c increases and a keeps at the primitive value. The grain refining and helium damage result in the diffraction peak broadening.     

Total Dose Radiation Tolerance of Phase Change Memory Cell with GeSbTe Alloy

Phase change memory （PCM） cell array is fabricated by a standard complementary metal-oxide-semiconductor process and the subsequent special fabrication technique. A chalcogenide Ge2Sb2Te5 film in thickness 50hm deposited by rf magnetron sputtering is used as storage medium for the PCM cell. Large snap-back effect is observed in current-voltage characteristics, indicating the phase transition from an amorphous state （higher resistance state） to the crystalline state （lower resistance state）. The resistance of amorphous state is two orders of magnitude larger than that of the crystalline state from the resistance measurement, and the threshold current needed for phase transition of our fabricated PCM cell array is very low （only several μA）. An x-ray total dose radiation test is carried out on the PCM cell array and the results show that this kind of PCM cell has excellent total dose radiation tolerance with total dose up to 2 ×10^6 rad（Si）, which makes it attractive for space-based applications.     

多发弹丸发射系统阀门电源及可编程发射控制器的研制

多发弹丸发射系统是我院20世纪90年代从俄罗斯引进的设备，用于发射弹丸的快阀门电源属于非标产品，其备件缺乏，维修困难。为保证HL-2A装置弹丸注入实验顺利进行，根据设计要求，研制了这套弹丸快阀电源和可编程发射控制器。它们之间的连接如图1所示。     

活动标形及其在点啮合齿轮传动误差分析中的应用

活动标形法的论述首推苏步青译，佐佐木重夫著《微分几何学》，还有的著作从外微分形式引入活动标形,本文论证取曲面的正交曲率网为参数网时，曲面论的基本公式就是活动标形的微分形式，并用其分析了点啮合齿轮传动误差．     

应变Si1-xGex层中p型杂质电离常温和低温特性

本文采用解析的方法计算了应变Si1-xGex层中p型杂质电离度与Ge组分x、温度T以及掺杂浓度N的关系.发现常温时,在同一Ge组分下,随着掺杂浓度的升高,杂质的电离度的先变小,而后又迅速上升到1.在同一掺杂浓度下,轻掺杂时,杂质的电离度随Ge组分的增加先变大,而后几乎不变;重掺杂时,杂质电离能变为0后,杂质电离度为1.低温下,轻掺杂时,载流子低温冻析效应较为明显,杂质的电离度普遍较小,当掺杂浓度大于Mott转换点时,载流子冻析效应不再明显,电离率迅速上升到1.在同一Ge组分下,随着掺杂浓度的升高,杂质的电离度先变小,后变大,而后又迅速上升到1.在同一掺杂浓度下,轻掺杂时,杂质的电离度随Ge组分的增加变大;重掺杂时,杂质电离能变为0后,杂质电离度为1.     

Effect of Incident Intensity on Films Growth in Pulsed Laser Deposition

Incident intensity, defined by the amount of particles deposited per pulse, is an important parameter in the film growth process of pulsed laser deposition （PLD）. Different from previous models, we investigate the irreversible and reversible growth processes by using a kinetic Monte Carlo method and find that island density and film morphology strongly depend on pulse intensity. At higher pulse intensities, lots of adatoms instantaneously diffuse on the substrate surface, and then nucleation easily occurs between the moving adatoms resulting in more smaller-size islands. In contrast, at the lower pulse intensities, nucleation event occurs preferentially between the single adatom and existing islands rather than forming new islands, and therefore the average island size becomes larger in this case. Additionally, our results show that substrate temperature plays an important role in film growth. In particular, it can determine the films shape and weaken the effect of pulse intensity on film growth at the lower temperatures by controlling the mobility rate of atoms. Our results can match the related theoretical and experimental results.