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采用金属有机分解法在p型Si衬底上制备了SrTiO3(STO)薄膜.研究了STO薄膜金属 绝缘体 半导体(MIS)结构的介电和界面特性.结果表明,STO薄膜显示出优异的介电性能,在10kHz处的介电常数约为105,损耗低于001,这来源于多晶结构和良好的结晶性;MIS结构中的固定电荷密度Nf和界面态密度Dit分别约为15×1012cm-2和(14—35)×1012cm-2eV-1,这主要与Si/STO界面处形成的低介电常数界面层有关.
关键词:
SrTiO3薄膜
MIS结构
介电性能
Si/STO界面 相似文献
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采用金属有机分解法在p型Si衬底上制备了SiTiO3(STO)薄膜.研究了STO薄膜金属-绝缘体-半导体(MIS)结构的介电和界面特性.结果表明,STO薄膜显示出优异的介电性能,在10kHz处的介电常数约为105,损耗低于0.01,这来源于多晶结构和良好的结晶性;MIS结构中的固定电荷密度Nf和界面态密度Dit分别约为1.5×1012cm-2和(1.4-3.5)×1012 cm-2 eV-1,这主要与Si/STO界面处形成的低介电常数界面层有关. 相似文献
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本文研究了红外探测器中红外焦平面列阵的象元———铁电薄膜微桥在红外辐射作用下的输出信号。用层合板壳作为微桥结构的力学模型,中间一层为压电材料,上下两层为金属材料电极。采用了力-电-热耦合的控制方程和变分原理,考虑了铁电薄膜的惯性力,推导出了基于Mindlin假设的压电材料层合板有限元公式。以红外探测器在夜间从飞机上探测地面的坦克为例,用有限单元法模拟了铁电薄膜微桥在红外辐射作用下的力、热、电输出信号,并对结果作了分析比较。 相似文献
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采用溶胶-凝胶法在Pt/Ti/SiO2/Si衬底上制备了不同La掺杂浓度PLZT(x/40/60)薄膜- x射线衍射分析表明制备的PLZT(x/40/60)薄膜是具有单一钙钛矿结构的多晶薄膜- 通过红外椭圆偏振光谱仪测量了波长为2-5—12-6μm范围内PLZT薄膜的椭偏光谱,采用经典色 散模型拟合获得PLZT薄膜的红外光学常数,同时也拟合获得PLZT薄膜的厚度- 随着La掺杂浓 度的增大,折射率逐渐减小- 而消光系数除PLZT(4/40/60)薄膜外,呈现逐渐增大的趋势- 分析表明这些差异主要与PLZ
关键词:
PLZT薄膜
红外光学性质
红外椭圆偏振光谱 相似文献
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Structural and electrical properties of SrTiO3 thin films as insulator of metal-ferroelectric-insulator-semiconductor (MFIS) structures 下载免费PDF全文
SrTiO3 (STO) thin films were deposited on p-Si(100) substrates at various substrate temperatures from 300℃ to 700℃ by radio frequency (RF) magnetron sputtering technique. Their structure and electrical properties were investigated. It was found that the transition from
amorphous phase to polycrystalline phase occurred at the substrate temperatures 300--400℃. Their crystallinity became better when the substrate temperatures further increased. The dielectric and leakage current measurements were carried out by using the Si/STO/Pt metal--insulator--semiconductor (MIS) structures at room temperature. It was found that the fixed charge density decreased and both the interface trap density and the dielectric constant increased when the substrate temperatures were increased. The leakage current mechanisms for STO MIS structures with STO films prepared at 700℃ followed the space charge limited current (SCLC) under the low applied electric field and the Poole--Frenkel emission under the high one. In addition, the resistivity for films prepared at 700℃ was higher than 1011\Omega \cdot cm under the voltage lower than 10V (corresponding to the electric field of 1.54\times 103kV\cdotcm-1). It suggested that the STO films prepared at 700℃ were suitable for acting as the insulator of metal--ferroelectric--insulator--semiconductor (MFIS) structures. 相似文献
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