单晶硅电火花铣削维持电压测定及蚀除机理研究

提出一种以电火花放电加工技术对半导体硅材料进行铣削加工的方法,建立了半导体放电加工电路模型,测量了半导体放电加工放电通道的维持电压,其值为18V.在此基础上,从放电能量和ANSYS仿真两个方面对单晶硅电火花铣削的蚀除机理进行了研究.通过单位能量蚀除量的计算,并与45钢比较,得出单位能量单晶硅的蚀除量是45钢的4倍,由此提出了单晶硅蚀除是热蚀除和热应力剥落综合作用的结果;通过仿真分别计算出单脉冲放电温度场和热应力场的蚀除量,其热应力剥落是热蚀除的4.6倍,与基于能量计算的分析结果基本吻合.最后实验验证了分析结果的正确性.     

Pressure-induced phase transitions in the ZrXY (X= Si,Ge, Sn;Y= S,Se, Te) family compounds

Pressure is an effective and clean way to modify the electronic structures of materials, cause structural phase transitions and even induce the emergence of superconductivity. Here, we predicted several new phases of the ZrXY family at high pressures using the crystal structures search method together with first-principle calculations. In particular, the ZrGeS compound undergoes an isosymmetric phase transition from P4/nmm-I to P4/nmm-II at approximately 82 GPa. Electronic band structures show that all the high-pressure phases are metallic. Among these new structures, P4/nmm-II ZrGeS and P4/mmm ZrGeSe can be quenched to ambient pressure with superconducting critical temperatures of approximately 8.1 K and 8.0 K, respectively. Our study provides a way to tune the structure, electronic properties, and superconducting behavior of topological materials through pressure.