改进水平籽晶气相法生长CdSe单晶

采用改进的双温区水平籽晶气相升华法,生长出尺寸为?15 mm ×35 mm的完整CdSe单晶体。经X射线衍射仪、能谱分析仪和傅里叶红外光谱仪的检测,CdSe单晶粉末衍射谱与标准衍射峰吻合较好,单晶摇摆曲线半高宽0.5°;Cd、Se化学计量比等于1∶0.977,接近理想比;晶体在2.5~20.0μm红外波段范围内的透过率T >65;,吸收系数α<0.1 cm-1。这些结果表明,采用本方法生长的晶体结晶性较好、成分均匀、透过率较高,品质良好,这对生长类似高蒸气压、高熔点的III-V、II-VI族晶体,会有所帮助。     

高纯硒化镉(CdSe)多晶原料的合成研究

硒化镉(CdSe)是一种重要的Ⅱ-Ⅵ族半导体材料,在核辐射探测、非线性频率转换等方面都有着重要的应用.高纯原料是生长优质CdSe单晶,实现上述应用的基础,但目前合成方法存在效率低、纯度不高等缺点.为此实验室对传统高温元素合成法进行优化,利用理论计算的反应温度点为指导,辅以外部加压,控制内外压差,有效实现原料的批量、安全合成,单次可合成200 g,经粉末衍射(XRD)、综合热分析(TG/DTA)、等离子发射光谱仪(ICP)等测试,合成的原料质量较好,能生长出较大尺寸单晶.文中对合成过程可能的纯度影响因素及控制措施也进行了相应讨论.     

Optical and defect properties of S-doped and Al-doped GaSe crystals

S-doped and Al-doped GaSe crystals are promising materials for their applications in nonlinear frequency conversion devices. The optical and defect properties of pure, S-doped, and Al-doped GaSe crystals were studied by using photoluminescence(PL) and Fourier transform infrared spectroscopy(FT-IR). The micro-topography of(0001) face of these samples was observed by using scanning electron microscope(SEM) to investigate the influence of the doped defects on the intralayer and interlayer chemical bondings. The doped S or Al atoms form the S_(Se)~0 or Al_(Ga)~(+1) substitutional defects in the layer GaSe structure, and the positive center of Al_(Ga)~(+1) could induce defect complexes. The incorporations of S and Al atoms can change the optical and mechanical properties of the GaSe crystal by influencing the chemical bonding of the layer structure. The study results may provide guidance for the crystal growth and further applications of S-doped and Al-doped GaSe crystals.