GaAs/AlAs超晶格的近共振喇曼散射研究

本文介绍GaAs/AlAs超晶格的室温近共振喇曼散射测量结果。由于超晶格中Fr?hlich相互作用的共振增强效应,GaAs LO声子偶模的散射得到了很大的增强。和前人的结果一样,在偏振谱我们观察到了偶模。但和前人的结果不同,在退偏振谱中我们观察到的是奇模,而不是偶模。从而证明了在近共振条件下LO声子限制模仍遵从与非共振时一样的选择定则。二级喇曼散射实验结果表明,在偏振谱中二级谱是由两个偶模组合而成,而在退偏振谱中的二级谱与前人的结果不同,由一个奇模与一个偶模组合而成。上述结果与最近提出的黄朱模型的预言是一 关键词：     

Influence of AlN buffer layer thickness on structural properties of GaN epilayer grown on Si (111) substrate with AlGaN interlayer

We present the growth of GaN epilayer on Si (111) substrate with a single AlGaN interlayer sandwiched between the GaN epilayer and AlN buffer layer by using the metalorganic chemical vapour deposition. The influence of the AlN buffer layer thickness on structural properties of the GaN epilayer has been investigated by scanning electron microscopy, atomic force microscopy, optical microscopy and high-resolution x-ray diffraction. It is found that an AlN buffer layer with the appropriate thickness plays an important role in increasing compressive strain and improving crystal quality during the growth of AlGaN interlayer, which can introduce a more compressive strain into the subsequent grown GaN layer, and reduce the crack density and threading dislocation density in GaN film.     

GaAs掺杂超晶格的光反射谱

不同调制光强下测量了MBE GaAs掺杂超晶格的室温光反射谱。较低光强下观察到一系列对应于禁戒跃迁(△n≠0)的精细结构,因此否定了它是三阶微商谱的可能性。明确提出了掺杂超晶格的光反射为一阶微商谱,并讨论了其产生机制。理论计算结果能较好地解释实验现象。 关键词：     

Optical Properties of Highly Strained GaInAs／GaAs Quantum Wells Grown by Sb Assistance

Optical properties of highly strained GaInAs/GaAs quantum wells (QWs) grown by molecular beam epitaxy with Sb assistance are investigated. The samples grown by Sb incorporation and Sb pre-deposition methods display high room-temperature photoluminescence (PL) intensity at extended 10ng wavelength. This result is explained by the surfactant effects of Sb during the growth of GaInAs/GaAs QW systems. An abnormal Sshaped temperature dependence of the PL peak position is found in the In0.42Ga0.58As/GaAs triple QWs sample grown with Sb pre-deposition. By investigating the transmission electron microscope images and time-resolved PL spectra, it is found that the S-shaped temperature dependence of the PL peak position originates from the exciton 10calization effect brought by the Sb-rich clusters on the QW interface.     

Temperature－Induced Switching－Over of the Luminescence Transitions in GaInNAs／GaAs Quantum Wells

Photoluminescence (PL) spectra of the GaInNAs/GaAs single quantum well (SQW) with different N compositions are carefully studied in a range of temperatures and excitation power densities. The anomalous S-shape temperature dependence of the PL peak is analysed based on the competition and switching-over between the peaks related to N-induced localized states and the peak related to interband excitonic recombination. It is found that with increasing N composition, the localized energy increases and the turning point of the S-shape temperature dependence occurs at higher temperature, where the localized carriers in the handrail states obtain enough thermal activation energy to be dissociated and delocalized. The rapid thermal annealing (RTA)effectively reduces the localized energy and causes a decrease of the switching-over temperature.     

硅中热施主的电子结构

利用20—300K的Hall系数测量和6-300K的红外光吸收,研究了含氧P型CZ硅单晶经450℃不同时间热处理后所产生的热施主问题。Hall系数测量表明:经100hr热处理的样品存在两个施主能级:E₁=58meV,E₂=110meV。对不同热处理时间的样品,从低温红外光吸收则可看见由于热施主所引起的复杂吸收光谱。这些吸收峰的数目随着热处理时间的加长而增加和加强。利用类氢模型和有效质量理论拟会和计算,可以证明与氧有关的热施主很可能是双重电荷施主。这些双重施主有多种组态,它与450℃热处理的时间有关。 关键词：     

Microstructure and strain films using in-plane grazing analysis of GaN epitaxial incidence x-ray diffraction

This paper investigates the major structural parameters, such as crystal quality and strain state of （001）-oriented GaN thin films grown on sapphire substrates by metalorganic chemical vapour deposition, using an in-plane grazing incidence x-ray diffraction technique. The results are analysed and compared with a complementary out-of-plane x- ray diffraction technique. The twist of the GaN mosaic structure is determined through the direct grazing incidence t of （100） reflection which agrees well with the result obtained by extrapolation method. The method for directly determining the in-plane lattice parameters of the GaN layers is also presented. Combined with the biaxial strain model, it derives the lattice parameters corresponding to fully relaxed GaN films. The GaN epilayers show an increasing residual compressive stress with increasing layer thickness when the two dimensional growth stage is established, reaching to a maximum level of-0.89 GPa.     

金属有机化学气相沉积法生长条件对AlN薄膜面内晶粒尺寸的影响

研究了金属有机化学气相沉积设备生长条件对AlN 薄膜质量的影响. 应用Williamson-Hall方法测试并分析了不同氮化时间、AlN缓冲层生长时间、 载气流量生长参数对AlN薄膜的面内晶粒尺寸的影响. 实验结果表明, 随着氮化时间减小, 缓冲层生长时间增加, 载气流量减少, AlN薄膜的侧向生长和岛的合并能力增强, 面内晶粒尺寸增大, 从而晶体质量也变好. 关键词： AlN Williamson-Hall 面内晶粒尺寸     

GaAs基GaAsSb/GaInAs双层量子阱的发光

嵌入GaAs中的GaAsSb／GaInAs量子阱因其在1．3～1．5μm光通信波段发光的潜力而受到关注,我们研究了一系列MBE生长的GaAsSb／GaInAs量子阱样品的光致发光,发现所有样品在室温下都出现了一个较强的、波长在1．3μm附近的低能峰和一个较弱的高能峰。变温及变激发功率的荧光谱测量研究发现,高能峰只有在150K以上的测试条件下才能观测到,并且其相对强度随着温度的升高而增加,其调制光谱显示出第一类跃迁的特征。他们建立了理论模型,计算的结果支持将这一发光峰指派为GaInAs层内电子的基态与重空穴激发态间的跃迁,并与实验数据吻合得很好。同时初步讨论了改善1．3μm的低能峰发光的方法。     

The effects of sapphire nitridation on GaN growth by metalorganic chemical vapour deposition

In situ optical reflectivity measurements are employed to monitor the GaN epilayer growth process above a low-temperature GaN buffer layer on a c-plane sapphire substrate by metalorganic chemical vapour deposition. It is found that the lateral growth of the GaN islands and their coalescence are promoted in the initial growth stage if optimized nitridation time and temperature are selected when the substrate is pre-exposed to ammonia. As confirmed by atomic force microscopy observations, the quality of the GaN epilayers is closely dependent on the surface morphology of the nitridated buffer layer, especially grain size and nucleation density.