升温程序对6H-SiC晶体生长初期籽晶石墨化的影响

本文利用有限元方法模拟不同升温程序对籽晶石墨化的影响,计算表明籽晶表面石墨化层厚度是由“倒温度差”区间的温度、持续时间和“倒温度差”绝对值综合决定.在升温程序初期可以采用较小功率阶梯加热,迅速升温节约时间;中期可以采用从现有功率线性加热至额定功率,这样使得籽晶原料“倒温度差”区间内温度值变小且减缓反应;同时还使“倒温度差”绝对值减小,抑制籽晶和原料间的输运.同时籽晶石墨化实验通过元素线扫描测量出石墨层厚度,也证实了理论计算的结果.     

用于SiC晶体生长的高纯原料的合成及性能研究

SiC原料的纯度、粒径和晶型直接影响生长单晶的结晶质量和电学性质,尤其是高纯半绝缘本征SiC晶体的制备需要使用高纯SiC原料.本文采用超高温真空烧结炉,选择Si粉和C粉作为反应物,通过XRD、SEM、激光粒度测试仪和GDMS等测试手段研究了合成温度、压强、时间及原料配比等工艺条件对SiC颗粒成核、生长、晶型、粒径及堆积密度等综合性能的影响.结果表明,自合成的SiC原料一致性好、颗粒度均匀、纯度达到或超过5N.最后,使用自合成原料进行晶体生长,进一步证实其完全满足高质量半绝缘SiC晶体的制备.     

Effect of vanadium on the room temperature ferromagnetism of V-doped 6H-SiC powder

This study focuses on the effect of V-doping on the ferromagnetism(FM) of 6H-SiC powder.The X-ray diffraction results indicate that V is inserted into the 6H-SiC lattice.The Raman spectra reveal that with a V concentration of 25 ppm,the crystalline quality and carrier concentration of 6H-SiC are hardly varied.It is found that after the V-doping process,the saturation magnetization(Ms) and the vacancy concentration of 6H-SiC are both increased.From these results,it is deduced that the effect of V might contribute mainly to the increase of vacancy concentration,thus resulting in the increase of Ms of V-doped 6H-SiC.     

Defects mediated ferromagnetism in a V-doped 6H—SiC single crystal

Undoped and V-doped 6H-SiC single crystals have been grown by the physical vapor transport method.The V concentration is determined to be 3.76×1017 at/cm3 and 6.14×1017 at/cm3 by secondary ion mass spectrometry for low V-doped and high V-doped SiC samples,respectively.The undoped 6H-SiC shows diamagnetism,while the V-doped 6H-SiC exhibits weak ferromagnetism.The lower V-doped sample shows stronger ferromagnetism compared to that of the higher V-doped sample.However,the structural characterization indicates that the lower V-doped SiC has a relative poor crystalline quality.It is found that both V dopants and defects are essential for introducing ferromagnetic exchange in V-doped SiC single crystals.