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Ⅲ-nitride semiconductor materials have excellent optoelectronic properties, mechanical properties, and chemical stability, which have important applications in the field of optoelectronics and microelectronics. Two-dimensional(2D)materials have been widely focused in recent years due to their peculiar properties. With the property of weak bonding between layers of 2D materials, the growth of Ⅲ-nitrides on 2D materials has been proposed to solve the mismatch problem caused by heterogeneous epitax... 相似文献
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氮化镓(GaN)晶体是制备蓝绿光激光器、射频微波器件以及电力电子等器件的理想衬底材料,在激光显示、5G通讯及智能电网等领域具有广阔的应用前景.目前市场上的氮化镓单晶衬底大部分都是通过氢化物气相外延(Hydride Vapor Phase Epitaxy,HVPE)方法生长制备的,在市场需求的推动下,近年来HVPE生长技术获得了快速的发展.本论文综述了近年来HVPE方法生长GaN单晶衬底的主要进展,主要内容包含HVPE生长GaN材料的基本原理、GaN单晶中的掺杂与光电性能调控、GaN单晶中的缺陷及其演变规律和GaN单晶衬底在器件中的应用.最后对HVPE生长方法的发展趋势进行了展望. 相似文献
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AlGaN基材料作为带隙可调的直接带隙宽禁带半导体材料,是制备紫外光电子器件的理想材料。在无法获得大尺寸、低成本的同质衬底的情况下,高质量AlN薄膜的异质外延是促进紫外光电子器件发展的关键。本文中,通过调节蓝宝石衬底上AlN的金属有机物化学气相沉积(MOCVD)生长模式产生高密度纳米级孔洞,利用纳米级孔洞降低AlN的位错,并在此基础上外延了AlGaN量子阱结构,得到了275 nm波段的深紫外LED薄膜,并制备了开启电压约为4.8 V,反向漏电电流仅为2.23 μA(-3.0 V电压时)的深紫外LED器件。 相似文献
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III-nitride semiconductor materials have excellent optoelectronic properties, mechanical properties, and chemical stability, which have important applications in the field of optoelectronics and microelectronics. Two-dimensional (2D) materials have been widely focused in recent years due to their peculiar properties. With the property of weak bonding between layers of 2D materials, the growth of III-nitrides on 2D materials has been proposed to solve the mismatch problem caused by heterogeneous epitaxy and to develop substrate stripping techniques to obtain high-quality, low-cost nitride materials for high-quality nitride devices and their extension in the field of flexible devices. In this progress report, the main methods for the preparation of 2D materials, and the recent progress and applications of different techniques for the growth of III-nitrides based on 2D materials are reviewed. 相似文献
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